Metasurface circularly-polarized light detection component and production method thereof

A technology of circularly polarized light and detection element, which is applied in the field of metasurface circularly polarized light detection element and its preparation, can solve the problems of incompatibility, difficulty in manufacturing, and low degree of structural differentiation, and achieves strong circular polarization dichroism, large The effect of application value and low time cost

Active Publication Date: 2018-11-13
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] To sum up, the existing three-dimensional space structure is complex in process and difficult to manufacture, and cannot be compatible with traditional lithography technology
The existing technology has disadvantages such as low structural discrimination, complex preparation process, and incompatibility with traditional semiconductor processes, which limits the development of circular polarization detection technology

Method used

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  • Metasurface circularly-polarized light detection component and production method thereof
  • Metasurface circularly-polarized light detection component and production method thereof
  • Metasurface circularly-polarized light detection component and production method thereof

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Embodiment 1

[0031] See figure 1 As shown, the metasurface circularly polarized light detection element of the present invention is composed of a light-transmitting substrate 1 and an array of rotationally symmetric chiral medium structural units 2 arranged on the light-transmitting substrate, and the rotationally symmetric chiral structures have mutual void.

[0032] The rotationally symmetrical chiral structural unit such as figure 2 As shown, the period P of the structural unit of the rotationally symmetrical chiral medium is 1.05 μm, the thickness H of the structural unit of the rotationally symmetrical chiral medium is 0.27 μm, the length L1 of the first arm 21 is 0.6 μm, and the length L2 of the second arm 22 is 1.05 μm. μm, the width W1 of the first arm 21 is 0.15 μm, the width W2 of the second arm 22 is 0.2 μm, the horizontal distance d1 between the center points of the two first arms 21 is 0.25 μm, and the distance between the two second arms 22 The center distance d2 is 0.3 μm...

Embodiment 2

[0042] The structural parameters of the rotationally symmetrical chiral medium are: the thickness H of the medium structure layer is 0.26 μm; the period P of the rotationally symmetrical chiral medium structure is 1.0 μm, the arm length L1 is 0.5 μm, the arm length L2 is 1.0 μm, and the center of the two arms L1 The horizontal distance d1 between the points is 0.21 μm, the distance d2 between the two arms L2 is 0.24 μm, the arm width W1 is 0.12 μm, the arm width W2 is 0.17 μm, and the angle θ between the two arms 21 and 22 is 40 °.

Embodiment 3

[0044] The structural parameters of the rotationally symmetric chiral medium are: the thickness H of the medium structure layer is 0.29 μm; the period P of the rotationally symmetrical chiral medium structure is 1.2 μm, the arm length L1 is 0.8 μm, the arm length L2 is 1.07 μm, and the center of the two arms L1 The horizontal distance d1 between the points is 0.27 μm, the distance d2 between the two arms L2 is 0.33 μm, the arm width W1 is 0.21 μm, the arm width W2 is 0.26 μm, and the angle θ between the two arms 21 and 22 is 55 °.

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Abstract

A metasurface circularly-polarized light detection component comprises a light-permeable substrate and rotationally symmetric chiral medium structural units arrayed on the light-permeable substrate; each rotationally symmetric chiral dielectric structural unit is composed of two pairs of dielectric arms crossed; a gap is formed between every two rotationally symmetric chiral dielectric structuralunits. The metasurface circularly-polarized light detection component may be made by means of electron beam lithography and photolithography, reactive ion etching and other processes. The metasurfacecircularly-polarized light detection component has great circularly-polarized dichroism, and can distinguish circular polarization states; the circularly-polarized dichroism is up to 96.8% at 1.75 mum; the metasurface circularly-polarized light detection component has excellent properties and is highly worthy of application in optical sensing systems, advanced nan photonic devices and integratedoptical systems.

Description

technical field [0001] The invention relates to a polarized optical detection element, in particular to a metasurface circularly polarized light detection element and a preparation method thereof. Background technique [0002] In imaging technology, because polarization imaging technology can perform long-distance image acquisition operations in harsh environments, it has absolute advantages in suppressing background noise, improving detection distance, obtaining detailed features, and identifying target camouflage. Therefore, it has a very wide range of applications, for example: it can detect hidden or camouflaged targets; it can realize the detection and identification of sea surface and underwater targets; it can realize navigation under smoky weather conditions; It can distinguish real targets from objects; it can perform medical diagnosis such as cancer and burns; it can identify object characteristics (such as fingerprints, etc.); it can realize spaceborne or airborne...

Claims

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Application Information

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IPC IPC(8): G01J3/447G01J3/02
CPCG01J3/0205G01J3/0291G01J3/447
Inventor 胡敬佩朱玲琳张方曾爱军黄惠杰
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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