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A method and device for preparing graphene by chemical vapor deposition from a controllable liquid carbon source

A chemical vapor deposition and graphene technology, applied in chemical instruments and methods, graphene, single-layer graphene, etc., can solve the problems of graphene nucleation and poor thickness uniformity, complex feeding method, poor controllability, etc. Achieve the effect of good uniformity, low production cost and controllable, low defect

Active Publication Date: 2020-11-20
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These feeding methods are complex and poorly controllable, which can easily lead to excess carbon source, poor graphene nucleation and thickness uniformity

Method used

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  • A method and device for preparing graphene by chemical vapor deposition from a controllable liquid carbon source
  • A method and device for preparing graphene by chemical vapor deposition from a controllable liquid carbon source
  • A method and device for preparing graphene by chemical vapor deposition from a controllable liquid carbon source

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Effect test

Embodiment 1

[0039] The invention provides a method and device for preparing graphene by a controllable liquid carbon source vapor deposition method, comprising the following steps:

[0040] (1) Dispersing the liquid carbon source in the polymer matrix to form a sol-state carbon source, the liquid carbon source is acetone, the polymer matrix is ​​nitrile-phenolic resin, the mass ratio of the liquid carbon source to the polymer matrix 2:1;

[0041] (2) Place the sol state carbon source in the carbon source feeder, the carbon source feeder is arranged at the inlet end of the chemical vapor deposition reactor, and the catalyst substrate is placed inside the chemical vapor deposition reactor;

[0042] (3) Introduce protective gas and hydrogen into the reactor as carrier gas, raise the central temperature of the reactor to 1040°C, control the internal temperature of the carbon source feeder to be 46°C, and make the carbon source feeder The carbon source steam evaporated from the feeder is mixe...

Embodiment 2

[0046] The invention provides a method and device for preparing graphene by a controllable liquid carbon source vapor deposition method, comprising the following steps:

[0047] (1) Dispersing the liquid carbon source in the polymer matrix to form a sol-state carbon source, the liquid carbon source is acetone, the polymer matrix is ​​nitrile-phenolic resin, the mass ratio of the liquid carbon source to the polymer matrix is 4:1;

[0048] (2) Place the sol state carbon source in the carbon source feeder, the carbon source feeder is arranged at the inlet end of the chemical vapor deposition reactor, and the catalyst substrate is placed inside the chemical vapor deposition reactor;

[0049] (3) Introduce protective gas and hydrogen into the reactor as carrier gas, raise the central temperature of the reactor to 1040°C, control the internal temperature of the carbon source feeder to 50°C, and make the carbon source feeder The carbon source steam evaporated from the feeder is mixe...

Embodiment 3

[0053] The invention provides a method and device for preparing graphene by a controllable liquid carbon source vapor deposition method, comprising the following steps:

[0054] (1) Disperse the liquid carbon source in the polymer matrix to form a sol-state carbon source, the liquid carbon source is acetone / ethyl acetate mixed solution, the polymer matrix is ​​nitrile-phenolic resin, and the liquid carbon source The mass ratio to the polymer matrix is ​​1:1;

[0055] (2) Place the sol state carbon source in the carbon source feeder, the carbon source feeder is arranged at the inlet end of the chemical vapor deposition reactor, and the catalyst substrate is placed inside the chemical vapor deposition reactor;

[0056] (3) Introduce protective gas and hydrogen into the reactor as carrier gas, raise the central temperature of the reactor to 1030°C, control the internal temperature of the carbon source feeder to 50°C, and make the carbon source feeder The carbon source steam evap...

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Abstract

The invention relates to a method and a device of preparing graphene by chemical vapor deposition of a controllable liquid carbon source and belongs to the technical field of material preparation. Themethod comprises the steps of dispersing the liquid carbon source in a high polymer matrix to form a collosol carbon source, mixing carbon source steam and carrier gas through a carbon source feeder,and performing reaction in a reactor to achieve large area continuous preparation of the single and double-layer graphene, wherein a carbon source content in a reaction atmosphere can be simply and conveniently controlled by adjusting a gas flow parameter and a heating temperature. The coverage area of the single-layer graphene is close to 100%, and the coverage area of the double-layer grapheneis above 80%. The prepared graphene is high in quality and good in uniformity and has resistance of about 500 omega / sq. A feeding method of the liquid carbon source is safe and low in cost, and the adopted high polymer matrix can be recycled. A chemical vapor deposition reaction device solves the problem of difficult feeding of the liquid carbon source; the portable carbon source feeder substitutes the traditional high-pressure carbon source gas cylinder; a technology is simpler; and the cost is lowered.

Description

technical field [0001] The invention relates to a method and a device for preparing graphene by chemical vapor deposition of a controllable liquid carbon source, and belongs to the technical field of graphene preparation by chemical vapor deposition. Background technique [0002] Since its discovery in 2004, graphene has attracted much attention due to its excellent properties. Single-layer graphene wafers obtained by tape mechanical exfoliation have a light transmittance of 97.7% and a carrier mobility as high as 2 × 10 5 cm 2 / Vs (Morozov, S.V.; Novoselov, K.S.; Katsnelson, M.I. et al. Giant Intrinsic Carrier Mobilities in Graphene and Its Bilayer. Physical Review Letters 2008, 100, 016602). However, such mechanically exfoliated graphene, limited by its production efficiency and size, is limited to research in laboratory microdevices. High cost and low quality restrict the application and development of graphene at the same time. To realize the application of graphene ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B32/186
CPCC01B32/186C01B2204/02C01B2204/04C01B2204/22
Inventor 朱宏伟陈巧
Owner TSINGHUA UNIV
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