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Texturization method of monocrystalline silicon chip for solar cells

A technology of solar cells and monocrystalline silicon wafers, applied in the direction of single crystal growth, single crystal growth, chemical instruments and methods, etc., can solve the problems of low efficiency, achieve high efficiency, narrow distribution, and improve the effect of texturing efficiency

Inactive Publication Date: 2018-04-27
DEQING LIJING ENERGY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing monocrystalline silicon texturing process usually requires 600 s-900 s of texturing time, and the efficiency is low. If the texturing time can be shortened, the production efficiency will be effectively improved

Method used

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  • Texturization method of monocrystalline silicon chip for solar cells
  • Texturization method of monocrystalline silicon chip for solar cells

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0012] The process steps are as follows:

[0013] 1. Configure texturing additives: 0.5 g of vinylpyrrolidone-vinylimidazole copolymer (number average molecular weight is ), 1 g of polyethylene glycol-polypropylene glycol-polyethylene glycol copolymer, 0.5 g of ethylenediaminetetra Acetic acid, 2 g monoethanolamine, 0.1 g sodium benzoate, and 0.25 g sodium p-toluenesulfonate were sequentially dissolved in 100 ml deionized water.

[0014] 2. Prepare lye: dissolve 10 g of sodium hydroxide in 990 g of deionized water to obtain an aqueous solution of sodium hydroxide with a mass fraction of 1%.

[0015] 3. Prepare alkaline texturing solution: mix the texturizing additive obtained in step 1 and the lye obtained in step 2 evenly at a mass ratio of 0.5:100.

[0016] 4. Texturing process: immerse the monocrystalline silicon wafer for solar cells into the alkaline texturing solution prepared in step 3 for surface texturing, and the texturing temperature is 85 o C, the texturing time ...

Embodiment 2

[0018] The process steps are as follows:

[0019] 1. Configure texturizing additives: 1 g of vinylpyrrolidone-vinylimidazole copolymer, 2 g of polyethylene glycol-polypropylene glycol-polyethylene glycol copolymer, 0.1 g of ethylenediaminetetraacetic acid, 0.5 g of monoethanolamine , 0.05 g sodium benzoate and 0.5 g sodium p-toluenesulfonate were successively dissolved in 100 ml deionized water.

[0020] 2. Prepare lye: dissolve 15 g of potassium hydroxide in 985 g of deionized water to obtain an aqueous solution of potassium hydroxide with a mass fraction of 1.5%.

[0021] 3. Prepare alkaline texturing solution: mix the texturizing additive obtained in step 1 and the lye obtained in step 2 evenly at a mass ratio of 1:100.

[0022] 4. Texturing process: immerse the monocrystalline silicon wafer for solar cells into the alkaline texturing solution prepared in step 3 for surface texturing, and the texturing temperature is 75 o C, the texturing time is 420 s.

Embodiment 3

[0024] The process steps are as follows:

[0025] 1. Configure texturizing additives: 2 g of vinylpyrrolidone-vinylimidazole copolymer, 1 g of polyethylene glycol-polypropylene glycol-polyethylene glycol copolymer, 0.5 ethylenediaminetetraacetic acid, monoethanolamine 3, benzene Dissolve 0.1 g of sodium formate and 0.5 g of sodium p-toluenesulfonate into 100 ml of deionized water in turn.

[0026] 2. Prepare lye: dissolve 20 g of sodium hydroxide in 980 g of deionized water to obtain an aqueous solution of sodium hydroxide with a mass fraction of 2%.

[0027] 3. Prepare alkaline texturing solution: mix the texturizing additive obtained in step 1 and the lye obtained in step 2 evenly in a mass ratio of 0.1:100.

[0028] 4. Texturing process: immerse the monocrystalline silicon wafer for solar cells into the alkaline texturing solution prepared in step 3 for surface texturing, and the texturing temperature is 88 o C, the texturing time is 300 s.

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Abstract

The invention provides a texturization method of a monocrystalline silicon chip for solar cells. The texturization method includes the steps of: dissolving a vinyl pyrrolidone-vinyl imidazole copolymer, a polyethylene glycol-polypropylene glycol-polyethylene glycol copolymer, ethylene diamine tetraacetic acid, monoethanolamine, sodium benzoate, and sodium p-toluenesulfonate in the balance water; adding a texturization additive prepared by step 1) into an alkali solution and mixing the substances evenly; and putting a monocrystalline silicon chip into a texturization solution prepared by step 2) and conducting texturization. During texturization of the monocrystalline silicon chip by the method provided by the invention, the texturization additive is added into the alkali solution accordingto certain proportion, thus realizing a rapid texturization effect.

Description

technical field [0001] The invention relates to the technical field of solar photovoltaic cells, in particular to a texturing method for monocrystalline silicon wafers for solar cells. Background technique [0002] The lye etches the [100] crystal plane of the single crystal silicon wafer faster, but the etching of the [111] crystal plane is slower. The resulting difference in etching rate will lead to the formation of a pyramid structure on the surface of the single crystal silicon wafer during the process of etching the silicon wafer with alkaline solution. The structure can effectively reduce the light reflection of the silicon wafer. In the preparation process of solar cells, the lower the reflection of silicon wafers to light, the more the absorption of light by silicon wafers, and the higher the conversion efficiency of solar cells. Texturing the surface of a single crystal silicon wafer by the above alkali etching method is one of the commonly used effective ways to...

Claims

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Application Information

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IPC IPC(8): C30B33/10C30B29/06H01L31/18
CPCC30B29/06C30B33/10H01L31/1804Y02E10/547Y02P70/50
Inventor 姜翰钦吴金丹周小国
Owner DEQING LIJING ENERGY TECH CO LTD
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