Heating control device and method for chemical vapor deposition

Abstract

The invention provides a heating control method for chemical vapor deposition equipment. The heating control method comprises the steps that a film coating chamber is arranged into multiple lattices which are arranged vertically and horizontally, each lattice is internally provided with a heat-emitting body and further internally provided with a temperature feedback device, and the heat emitting bodies and the temperature feedback devices are all connected with a heating controller; 2, the film coating chamber is sealed, and vacuum extraction is conducted to reach 0.01-1 Torr through a vacuumsystem; 3, the heat-emitting bodies and the temperature feedback devices are utilized to be connected with the heating controller, and the temperature of the area where the lattices are located is controlled to be within the range from 30 DEG C to 100 DEG C; and 4, a parylene material is put into an evaporation chamber to be heated and gasified, after a cleavage reaction is conducted through a cleavage chamber, gas is formed, the gas enters the film coating chamber, and in the gas introduction process, the temperature of the area where the lattices are located is maintained to be 30-100 DEG C,so that a thin film material is obtained. According to the heating control method, area division is conducted through the lattices; independent heating is conducted for temperature control; and the crystallization rate of parylene film coating is increased, and uniformity of parylene film coating is improved.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition (CVD), in particular to a heating control device and a heating control method for chemical vapor deposition. Background technique [0002] Chemical vapor deposition (CVD) is a traditional technique for preparing thin films, which is widely used in the deposition of various materials in the semiconductor industry, including a wide range of insulating materials, most metal materials and metal alloy materials. The principle is to use gaseous precursor reactants to decompose or react with each other in some components of gaseous precursors through chemical reactions between atoms and molecules, and deposit and form thin films on the substrate. [0003] Existing parylene coating equipment can be roughly divided into two types: barrel type coating machine and box type coating machine. The working principles of the two are basically the same, the main difference is the shape of the vac...

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Problems solved by technology

[0004] In order to solve the above problems, the present invention provides a chemical vapor deposition heating control device and heating control method to solve a series of problems such as whitening of the film layer, uneven film thickness, and tissue defects in the current chemical vapor deposition process.

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