Flexible ultraviolet (UV) detector of photodetector structure
An ultraviolet detector and phototransistor technology, applied in the field of ultraviolet detectors, can solve the problems of difficulty in realizing miniaturization and arraying of devices, incompatibility of processes, etc., and achieve the effects of strengthening injection and separation, improving detection performance, and high responsivity.
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Embodiment 1
[0031] In the ultraviolet detector of the first inorganic perovskite phototransistor structure of the present invention, the substrate 1 is a glass substrate, and CsPbX is prepared on the substrate 1 3 Thin film 2 serves as the active layer, in CsPbX 3 Preparation of CsPbX with the same substance on the surface of film 2 3 The PMMA organic layer 4 doped with quantum dots 5 is used as the gate insulating layer, which serves as the ultraviolet light sensing window; the source electrode 3.1 and the drain Au electrode 3.2 of the thin film transistor are respectively located on the CsPbX 3 On both sides of the film 2, the FTO gate 6 is located on the CsPbX 3 In the middle of the film 2, under the modulation of the source 3.1 of the thin film transistor, the drain Au electrode 3.2 and the FTO gate 6, the integrated functions of photo-generated carrier separation, converted electrical signal reading, and amplification are obtained to achieve high response Ultraviolet signal detecti...
Embodiment 2
[0038] In the ultraviolet detector of the second inorganic perovskite phototransistor structure of the present invention, the substrate 1 is a glass substrate, an FTO conductive thin film layer is prepared on the substrate 1 as the gate 6, and CsPbX is prepared on the gate 6 3 The PMMA organic layer 4 doped with quantum dots 5 is used as a gate insulating layer, and homogeneous CsPbX is spin-coated on the gate insulating layer 3 Thin film 2 is the active layer, and the source electrode 3.1 and the drain Au electrode 3.2 are located on the CsPbX 3 On both sides of the thin film 2, under the modulation of the source 3.1 of the thin film transistor, the drain Au electrode 3.2 and the FTO gate 6, the integrated functions of photo-generated carrier separation, converted electrical signal reading, and amplification are obtained to achieve high-responsiveness UV signal detection. CaB 3 Quantum dots are synthesized and purified in the same way as in Example 1.
[0039] The phototra...
Embodiment 3
[0045] CaB 3 Quantum dots are synthesized and purified in the same way as in Example 1.
[0046] The fabrication process of the flexible phototransistor is as follows:
[0047] a) Preparation of FTO grid 6: On the PET substrate 1, a magnetron sputtering technique is used to prepare an FTO transparent film, and a photolithography technique is used to prepare an FTO gate electrode.
[0048] b) Preparation of gate insulating layer 4: CsPbX 3 The molar ratio of quantum dots and PMMA is dissolved in toluene solution with a concentration of 20 mg / mL. The film is formed by spin coating on the surface of the substrate on which the FTO gate has been formed. A gate insulating layer with uniform photoresponse characteristics.
[0049] c) Prepare the channel layer: prepare CsPbX on the gate insulating layer by spin coating 3 Film 2, spin coating speed 2000rpm, time 30s, CsPbX 3 Quantum dot concentration 20mg / mL, annealed at 130°C for 15min.
[0050] d) The process for preparing the ...
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