A kind of crucible and preparation method thereof
A crucible and coating technology, which is applied to the crucible for preparing polysilicon and the preparation field thereof, can solve the problems of weakening the effect of the bottom high-efficiency layer, wide red zone on the side of the silicon wafer, and high local defect density, and achieves uniform and dense structure of the structural layer. The effect of reducing the lateral red zone and dense structure
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[0043] The present invention will be described in detail in conjunction with the accompanying drawings.
[0044] like figure 1 , The present invention provides a crucible, comprising:
[0045] Crucible body 1;
[0046] A first coating layer 2, which is provided on the bottom and side walls of the crucible body 1 for preventing the metal impurities in the crucible body 1 to the crucible body 1 crystals spread, affecting the quality of the crystal;
[0047] A second coating layer 3, which is provided on the first coating layer located on the outer side wall 2, the second coating for assisting in the crucible 3 on the side wall of the body 1 is small crystal nucleation of the side portion of the small grains a low defect density, the smaller bottom columnar grain pressing force, providing better conditions for the bottom of the vertical growth of columnar crystals; and
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