A method for establishing artificial grassland under a photovoltaic rack
A kind of artificial and photovoltaic technology, applied in the field of planting, can solve the problems of low forage yield, harsh ecological environment conditions, and difficulty in planting forage, so as to achieve the effect of improving land utilization, promoting development, and improving economic benefits
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0044] 1. The general situation of the test site under the photovoltaic rack and the determination of soil nutrient content before sowing
[0045] The test site is located in Jinqiao Development Zone, Hohhot City, with a total scale of 100 mu. The area is located at 40°49′ north latitude, 111°41′ east longitude, and 1043m above sea level. It is a typical continental climate, with an annual average temperature of 5.4°C, the coldest month in January, with an extreme minimum temperature of -33.6°C, the hottest month in July, with an extreme maximum temperature of 36°C; the annual average sunshine is 1,600 hours; the annual average precipitation is 400mm, mostly concentrated in From July to September, there is little snow in winter; the frost-free period is 113-134 days, the first frost period is in the middle and late September, and the last frost period is at the end of May. The terrain is flat and open, the soil is chestnut soil, the soil is compact, and the pH is 7.6. The so...
PUM
![No PUM](https://static-eureka-patsnap-com.libproxy1.nus.edu.sg/ssr/23.2.0/_nuxt/noPUMSmall.5c5f49c7.png)
Abstract
Description
Claims
Application Information
![application no application](https://static-eureka-patsnap-com.libproxy1.nus.edu.sg/ssr/23.2.0/_nuxt/application.06fe782c.png)
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com