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A gas purification device and its application

A gas purification device and gas technology, applied in chemical instruments and methods, separation methods, dispersed particle separation, etc., can solve the problem of humidity and partial pressure of oxygen at the outlet of the equipment without real-time monitoring, difficulty in removing moisture in the gas, and the scope of application of the gas Small problems, to achieve the effect of improving deoxidation capacity and deoxidation efficiency, low cost, and improved purification quality

Inactive Publication Date: 2019-09-10
CENT SOUTH UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The technical problem solved by the present invention is: to solve the problems of low purification efficiency of existing gas purification equipment, small scope of gas application, difficulty in removing moisture in the gas, and no real-time monitoring of humidity and oxygen partial pressure at the outlet of the equipment, etc., a purification method is provided. Gas method for the preparation of protective gases with low oxygen content in factories and laboratories

Method used

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  • A gas purification device and its application

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Embodiment

[0035] see figure 1 , a gas purification device in the illustration is a preferred solution of the present invention, specifically including a gas cylinder 1, a dehumidification purification chamber 2, a first deoxygenation purification chamber 31, a second deoxygenation purification chamber 32, a third deoxygenation purification chamber 33, a A heating furnace 41 , a second heating furnace 42 , a third heating furnace 43 , an oxygen content testing probe 5 and a hygrometer 6 . The gas cylinder 1 is connected in series with the dehumidification and purification chamber 2, the first deoxygenation purification chamber 31, the second deoxygenation purification chamber 32, and the third deoxygenation purification chamber 33 through pipelines to dehumidify and deoxygenate the gas in the gas cylinder three times.

[0036] The gas cylinder 1 is used to store the gas to be purified, and is connected to the inlet pipeline of the dehumidification and purification chamber 2. A single gas...

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Abstract

The invention discloses a gas purifying device and an application thereof. The gas purifying device comprises a dehumidifying purifying chamber, a first deoxidizing purifying chamber, a second deoxidizing purifying chamber and a third deoxidizing purifying chamber which are serially connected by a pipeline. The inlet of the dehumidifying purifying chamber is connected with a gas bottle of a protective gas. The interior of the dehumidifying purifying chamber is filled with a silica gel dehumidizer. The interior of the first deoxidizing purifying chamber is filled with one of simple substance copper or copper-based alloy as a deoxidizing purifier. The interior of the second deoxidizing purifying chamber is filled with one of simple substance molybdenum or molybdenum-based alloy as the deoxidizing purifier. The interior of the third deoxidizing purifying chamber is filled with one of simple substance titanium, titanium sponge or titanium-based alloy as the deoxidizing purifier. The first deoxidizing purifying chamber, the second deoxidizing purifying chamber and the third deoxidizing purifying chamber are provided with heating units. The gas purifying device is capable of executing the adsorption removal to water vapor and oxygen in the gas, and satisfying various requirements in the experiment and production for the atmosphere environment, and has the characteristics of simple operation, rapid purifying speed, long service time of the purifier, and low cost.

Description

technical field [0001] The invention relates to a gas purification device and its application, belonging to the technical field of chemical reaction gas purification. Background technique [0002] In terms of protective gas preparation, especially in the fields of ultra-large-scale integrated circuits, laser materials, optical fibers, and aerospace materials, the production process is required to be carried out in an ultra-clean environment system. For example, the semiconductor manufacturing process requires that the oxygen in the gas be reduced to 10 -6 ppm, even 10 -15 ~10 -23 ppm, which requires the use of a suitable deoxidizer to remove oxygen to meet the requirements. [0003] Therefore, in the process of product production in the factory or in the experimental process of the laboratory, many processes need to be carried out after the atmosphere is protected. The measuring standard of protective atmosphere mainly includes the humidity of the atmosphere and the oxyge...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/26B01D53/28B01D53/30B01D53/46B01D53/75B01D53/82
Inventor 王万林周乐君路程高尔卓朱晨阳张凯旋龙旭凯
Owner CENT SOUTH UNIV
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