Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Light emitting element and electron beam deposition apparatus for manufacturing same

An electron beam deposition and light-emitting element technology, which is applied in the manufacture of semiconductor/solid-state devices, electrical components, circuits, etc., can solve the problems of thick substrates or metal supports, inability to form ultra-thin pixels, and performance degradation of small light-emitting elements, etc. To achieve the effect of improved ladder coverage

Active Publication Date: 2017-09-26
LG INNOTEK CO LTD
View PDF6 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, in the case of a horizontal type light emitting element in which a substrate remains after growing the light emitting substrate and a vertical type light emitting element in which a metal support is coupled to one side of the light emitting structure and the substrate is removed, the substrate Or the metal standoff is too thick to make a super thin pixel
[0008] In addition, when the step coverage of the semiconductor layer or metal layer provided on the stepped portion is poor, the performance of a small light emitting element used in an ultra-thin type pixel may deteriorate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Light emitting element and electron beam deposition apparatus for manufacturing same
  • Light emitting element and electron beam deposition apparatus for manufacturing same
  • Light emitting element and electron beam deposition apparatus for manufacturing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] Hereinafter, the embodiments will be described in detail with reference to the accompanying drawings, so as to specifically achieve the above-mentioned objects.

[0032] In the description of the embodiments disclosed herein, it should be understood that when an element is referred to as being formed "on" or "under" another element, it can mean directly being "on" or "under" the other element. Or it is indirectly formed "above" or "below" other elements, with one or more elements interposed therebetween. It should also be understood that “on” or “under” an element may be described with respect to the drawings.

[0033] In addition, for example, related terms such as "first", "second", "above / upper / above" and "below / lower / below" used in the following description can be used to distinguish any substance or element from Another substance or element without requiring or containing any physical or logical relationship or sequence between these substances or elements.

[0034] In ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A light emitting element of an embodiment may comprise: a light emitting structure including a first conductive type semiconductor layer, an active layer, and a second conductive type semiconductor layer; and first and second electrodes placed on the first and second conductive type semiconductor layers respectively, wherein the light emitting structure includes a first mesa region, the first conductive type semiconductor layer includes a second mesa region, and the first electrode includes: a first region which is a partial region of the upper surface of the second mesa region; a second region which is the side surface of the second mesa region; and a third region arranged to extend from the edge of the side surface of the second mesa region, wherein the first, second, and third regions are formed such that the thicknesses of the first region (d1), the second region (d2), and the third region (d3) have a ratio of d1:d2:d3 = 1:0.9-1.1:1.

Description

Technical field [0001] The embodiment relates to a light-emitting element and an electron beam deposition apparatus for forming an electrode layer of the light-emitting element. Background technique [0002] Due to, for example, many advantages such as a wide and easily adjustable band gap energy, III-V compound semiconductors such as, for example, GaN and AlGaN are widely used in optoelectronics and electronic components. [0003] Specifically, through the development of element materials and thin film growth technology, for example, light-emitting elements using III-V or II-VI group compound semiconductors or laser diodes can realize light-emitting elements such as red, green and blue, and ultraviolet light. Various colors of light, and by using fluorescent materials or by combining colors, white light with high luminous efficacy can also be realized. Compared with existing light sources such as, for example, fluorescent lamps and incandescent lamps, these light-emitting element...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/38H01L21/285H01L21/687
CPCH01L21/28575H01L21/68764H01L33/385H01L2933/0016H01L33/005H01L33/38H01L21/67161H01L24/24H01L27/156H01L33/06H01L33/10H01L33/20H01L33/30H01L33/405H01L33/42H01L33/44H01L33/62
Inventor 孙秀亨李建和崔炳均崔光基
Owner LG INNOTEK CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products