Flip LED chip array structure and preparation method thereof
A technology of LED chip and array structure, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of high current density, increased number of chip cutting, small chip power, etc., to achieve uniform current density distribution and effective light emitting area. Improve, fit the effect of increasing the effective area
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[0045] Such as figure 1 As shown, the preparation method of the flip-chip LED chip array structure includes the following steps:
[0046] (1) A multi-element composite of one or more materials among sapphire, gallium nitride, and aluminum nitride is selected as the transparent substrate 1 for epitaxial growth.
[0047] (2) On the surface of the transparent substrate 1, the buffer layer 2, the N-type GaN semiconductor structure layer 3 and the P-type GaN semiconductor structure layer 4 are epitaxially grown in sequence to obtain a substrate epitaxial wafer, such as figure 2 shown.
[0048] (3) A plurality of N-type region windows 5 are etched on the surface of the epitaxial structure layer by using semiconductor process technologies such as photolithography, development, and etching, and a plurality of small-area N-type region windows 5 are arranged in an array, such as image 3 shown.
[0049] (4) The current diffusion layer 6 is prepared by photolithographic masking, sput...
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