Flexible resistive random access memory and preparation method
A resistive memory and flexible technology, applied in electrical components and other directions, can solve the problems of imperfect flexible memory manufacturing process and other problems, and achieve the effects of excellent flexibility, good electrical durability, and large distinction between two states.
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[0043] image 3 It is a flowchart of the preparation method of the flexible resistive memory of the present invention, including:
[0044] Step 301: cleaning the flexible substrate: gently wipe the surface of the substrate with alcohol, and then dry it with a nitrogen gun;
[0045] Step 302: forming an electrode on a flexible substrate: using magnetron sputtering, e-book evaporation or thermal evaporation technology to deposit a bottom electrode on the substrate;
[0046] Step 303: forming a device pattern on the bottom electrode by photolithography: using a patterning process of photolithography to form a pattern of the desired device on the bottom electrode;
[0047] Step 304: continue to deposit the rare earth oxide thin film storage function layer: use magnetron sputtering technology to deposit rare earth oxide storage function layer materials on the photoresist;
[0048] Step 305: Form a top electrode on the rare earth oxide thin film storage functional layer: use magne...
Embodiment 1
[0051] An embodiment of a method for preparing a rare earth oxide flexible resistive memory, specifically comprising the following steps:
[0052] Step 301: cleaning the substrate, gently wiping the polyethylene terephthalate (PET) with alcohol for 5 minutes, and then drying it with a nitrogen gun.
[0053] Step 302: Use magnetron sputtering technology to deposit Pt on the PET substrate to form the bottom electrode. The specific process is as follows: background vacuum 5×10 -5 Pa, working pressure 1Pa, Ar gas flow 20sccm, RF power 60W, deposition time 2min, Pt thin film 40nm.
[0054]Step 303: Use a positive photoresist to construct a memory cell pattern, use a positive mask to expose and develop the photoresist layer, retain the unexposed areas in the photoresist layer, and remove the exposed parts of the photoresist layer area, thereby defining the pattern of the device structure in the photoresist layer, and the diameter of the exposed device unit is 100 μm.
[0055] Step...
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