Temperature adjustment device and method of focusing ring
一种调整装置、聚焦环的技术,应用在放电管、电气元件、等离子体等方向,能够解决线路布置复杂、影响装置处理反应效果、射频干扰等问题,达到避免射频干扰、改良处理工艺、良好传热性能的效果
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[0032] The invention provides a temperature adjustment device for a focus ring, which is suitable for a capacitively coupled plasma processing device. In the plasma processing device, such as figure 2 and image 3 , including the reaction chamber 10 whose interior is basically a vacuum environment, the top of the reaction chamber 10 is provided with an air inlet device such as a gas shower head 20 to connect with the reaction gas source, and the air inlet device is provided with a grounded upper electrode. The bottom in the reaction chamber 10 is provided with a pedestal 30 carrying the substrate 40, the pedestal 30 can be made of aluminum, and the interior is provided with a cooling medium pipeline to be connected to the cooling system; the pedestal 30 is provided with a lower electrode and applied with The radio frequency power forms a radio frequency electric field between the upper electrode and the lower electrode, and the reactive gas introduced into the reaction chamb...
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