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Multi-stage Magnetic Field Arc Ion Plating Method of Lined Conical Tube and Porous Baffle Composite

A technology of arc ion plating and porous baffles, which is applied in the field of material surface treatment, can solve the problems of low arc plasma transmission efficiency and large particle defects, so as to avoid large particle defects, improve crystal structure and stress state, and improve transmission efficiency Effect

Active Publication Date: 2019-09-10
ZHENGZHOU UNIVERSITY OF AERONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the traditional arc ion plating method using low-melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the arc plasma transmission efficiency caused by the curved magnetic filter technology. Low-level problems, combined with the multi-stage magnetic field filtering method and the combination of the shape and structure of the lined positive bias conical tube and the porous baffle composite device itself, the mechanical barrier shielding and the composite effect of positive bias electric field attraction, while ensuring the arc The plasma passes through the multi-stage magnetic field filter device and the composite device lined with positive bias conical tube and porous baffle with high transmission efficiency, so that the surface of the workpiece can be continuously and densely prepared with high-quality thin film under the condition of negative bias voltage. At the same time, it can control the addition of elements in the film, reduce the production cost of using alloy targets, improve the deposition efficiency of the film, and reduce the adverse effects of large particle defects on the growth and performance of the film. A composite type of lined conical tube and porous baffle is proposed. multistage magnetic field arc ion plating method

Method used

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  • Multi-stage Magnetic Field Arc Ion Plating Method of Lined Conical Tube and Porous Baffle Composite
  • Multi-stage Magnetic Field Arc Ion Plating Method of Lined Conical Tube and Porous Baffle Composite
  • Multi-stage Magnetic Field Arc Ion Plating Method of Lined Conical Tube and Porous Baffle Composite

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specific Embodiment approach 1

[0015] Specific implementation mode one: the following combination figure 1 , figure 2 , image 3 with Figure 4 Describe this embodiment, the device used in the multi-stage magnetic field arc ion plating method of the lined tapered tube and porous baffle composite type in this embodiment includes a bias power supply 1, an arc power supply 2, an arc ion plating target source 3, and a multi-stage magnetic field Device 4, multi-stage magnetic field power supply 5, composite device lined with positive bias conical tube and porous baffle 6, positive bias power supply 7, sample stage 8, bias power supply waveform oscilloscope 9 and vacuum chamber 10;

[0016] The method includes the following steps:

[0017] Step 1. Place the substrate workpiece to be processed on the sample stage 8 in the vacuum chamber 10, and insulate the composite device 6 from the vacuum chamber 10 and the multi-stage magnetic field device 4 with the liner positive bias conical tube and the porous baffle p...

specific Embodiment approach 2

[0026] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the method also includes:

[0027] Step 3: Thin films can be deposited by combining traditional DC magnetron sputtering, pulsed magnetron sputtering, traditional arc ion plating and pulsed cathodic arc with DC bias, pulse bias or DC pulse composite bias to prepare pure metal films , compound ceramic films with different element ratios, functional films and high-quality films with nano-multilayer or gradient structures.

specific Embodiment approach 3

[0028] Embodiment 3: The difference between this embodiment and Embodiment 2 is that Steps 1 to 3 are repeated to prepare multi-layered thin films with different stress states, microstructures and element ratios, and the others are the same as Embodiment 2.

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Abstract

The invention discloses a lining conical pipe and porous baffle composite multi-level magnetic field arc ion plating method, belongs to the technical field of material surface treatment and aims at solving the problems about pollution of macroparticles and deposition ions in a multi-level magnetic field filtering device to the pipe inner wall and losses of arc plasmas in the transmitting process. The method comprises the steps that firstly, a workpiece to be coated is placed on a sample table in a vacuum chamber, a related power source is turned on, and an outer water cooling system is started; secondly, film deposition is conducted, when the vacuum degree in the vacuum chamber is smaller than 10<-4>Pa, inflation of working gas is conducted, the air pressure is adjusted, a coating power source is started, and meanwhile a bias power source is utilized for attracting arc plasmas at the position of an outlet and conducting energy adjustment; and through stopping and shielding of a shape and structure combination of a lining positive bias conical pipe and porous baffle composite device, the inhibiting effect of a positive bias electric field and the filtering effect of a multi-level magnetic field, the macroparticle defect is effectively overcome, the transmission efficiency of the arc plasmas is guaranteed, technology parameters are set, and film preparing is conducted.

Description

technical field [0001] The invention relates to a composite multistage magnetic field arc ion plating method of a lined tapered tube and a porous baffle, and belongs to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles per unit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/32
Inventor 魏永强宗晓亚陈小霞张新国张华阳侯军兴刘源刘学申蒋志强冯宪章
Owner ZHENGZHOU UNIVERSITY OF AERONAUTICS
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