Cleaning method of texture surface making equipment for single crystal silicon
A single-crystal silicon technology, single-crystal silicon technology, applied in chemical instruments and methods, crystal growth, final product manufacturing, etc., can solve the problems of chemical liquid pollution, difficult to remove organic matter, influence of texturing additives, etc., and prolong the service life. , The effect of ensuring conversion efficiency and saving maintenance costs
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[0027] The present invention will be described in further detail below in combination with specific embodiments.
[0028] The technological process of the present invention is draining, washing with water, removing fragments, washing with water, wiping, washing with water, soaking, and washing with water. Compared with the existing cleaning method, the steps of wiping and soaking are added. To wipe, use a dust-free cloth soaked in alcohol to wipe, and the soaking solution uses a certain proportion of chemical reagents to ensure the cleaning effect and improve the cleanliness of the process tank.
[0029] The concrete operation of each cleaning step of the present invention is as follows:
[0030] (1) Drainage: Drainage of each tank;
[0031] (2) Rinse with water, rinse the tank body: ①Open the drain valve of each tank, rinse the tank body with a water gun; ;
[0032] (3) Clean up the debris: Add water to rinse and clean up the debris, use a water gun to clean up the debris ...
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