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Preparation method of a force-responsive nanoscale photonic crystal material

A photonic crystal and responsive technology, applied in optics, optical components, instruments, etc., can solve the problems of difficulty in preparing nanometer-scale photonic crystals, limited precision level of photonic crystals, poor structure controllability, etc., and shorten the preparation cycle , short preparation cycle, and the effect of improving efficiency

Active Publication Date: 2017-12-19
SHANDONG UNIV OF SCI & TECH
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  • Description
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  • Application Information

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Problems solved by technology

Therefore, it is difficult to prepare nanoscale photonic crystals by laser holographic interferometry
[0008] In a nutshell, the existing preparation methods of force-responsive photonic crystal materials generally have the following disadvantages or deficiencies: complex process, long preparation cycle, and high cost; Poor structure controllability

Method used

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  • Preparation method of a force-responsive nanoscale photonic crystal material
  • Preparation method of a force-responsive nanoscale photonic crystal material
  • Preparation method of a force-responsive nanoscale photonic crystal material

Examples

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Embodiment 1

[0045] 1. If figure 1 As shown, the preparation steps of the quartz template with photonic crystal pattern are as follows:

[0046] (1) According to actual needs, pre-design the structural parameters of photonic crystals, mainly including: the surface structure is a hexagonal columnar lattice, the lattice period is 200nm, the diameter of the raised columns is 100nm, and the height of the raised columns is 150nm. The effective area is 20×20mm 2 .

[0047] (2) According to the structural parameters of the photonic crystal above, design the structural parameters of the quartz template, mainly including: the surface structure is a hexagonal array of columnar holes, the lattice period is 200nm, the diameter of the columnar holes is 100nm, and the height of the columnar holes is 150nm , the effective area is 20×20mm 2 .

[0048] (3) Take a quartz substrate (size is 25mm × 25mm), according to the structural parameters of the above-mentioned quartz template, use electron beam lith...

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Abstract

The invention discloses a method for preparing a force-responsive nanoscale photonic crystal material. Electron beam lithography technology and reactive ion etching technology are used to etch a nanoscale pattern according to pre-designed photonic crystal structure parameters. The rigid template is used as the filling template, the highly elastic gel with excellent mechanical properties is used as the matrix material, and the viscoelastic polymer is used as the filling material. By filling the template, the pre-designed photonic crystal pattern is "transferred" to the viscose In elastic polymers, nanoscale, structure-controllable and force-responsive photonic crystal materials are prepared through steps such as spin coating and stacking. Compared with the prior art, the preparation method of the present invention has the characteristics of simple process, short process, easy control of process parameters, reusable template, high product precision level, stable and reliable quality, and low cost.

Description

technical field [0001] The invention relates to a method for preparing a photonic crystal material, in particular to a method for preparing a force-responsive nanoscale photonic crystal material. Background technique [0002] The preparation of the force-responsive photonic crystal material is completed by filling the highly elastic gel material with excellent mechanical properties in the nanoscale photonic crystal lattice gap. Through mechanical stretching or compression, the highly elastic polymeric network structure will increase or decrease the lattice spacing of photonic crystals, resulting in changes in diffraction wavelength and structural color, and realize the transformation of physical deformation into optical performance changes. Sensing function. [0003] Studies have shown that the multilayer structure composed of highly elastic gel and viscoelastic polymer with nanoscale photonic crystal structure has good mechanical response performance. This kind of photoni...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/00
CPCG02B1/005
Inventor 王清张睿郑旭马立俊张艳菊张星远杜文全
Owner SHANDONG UNIV OF SCI & TECH
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