Preparation method of quartz glass
A quartz glass and porous quartz technology, applied in glass manufacturing equipment, glass molding, manufacturing tools, etc., can solve the problems of prolonged production cycle, high energy consumption, low purity and uniformity of quartz glass, etc. The process is simple and the effect of increasing the preparation cost
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[0029] The preparation method of quartz glass provided by the present invention comprises the following steps:
[0030] Pre-deposition: The quartz particles are heated and melted at an ambient temperature of 1500°C to 1800°C, sprayed on the substrate and completely melted to form a transparent quartz glass base layer.
[0031] Preferably, the ambient temperature is between 1550°C and 1700°C; by means of rotary spraying, the feeding rate is lower than 100g / min, more preferably between 8g / min and 40g / min; the height of the transparent quartz glass base layer is more than 10mm , preferably 15mm or more.
[0032] (a) heating the quartz particles to partial melting to form a porous quartz body; specifically:
[0033] The oxyhydrogen flame is used to heat the quartz particles until they are partially melted and sprayed on the substrate to form a porous quartz body.
[0034] Preferably, it is sprayed on a pre-deposited transparent quartz glass substrate, and the substrate can move ...
Embodiment 1
[0046] A preparation method of quartz glass, comprising the following steps:
[0047] Pre-deposition: as figure 1 As shown, the blowtorch (4) is connected to H at the same time 2 Pipe (13) and O 2 In the pipeline (14), hydrogen and oxygen are ignited to form a hydrogen-oxygen flame (8), and the theoretical reaction ratio of hydrogen and oxygen is 2:1. In the present invention, in order to ensure that hydrogen is fully burned, the ratio of hydrogen and oxygen is controlled at 1.0:1~1.8 : 1, so that the oxygen is relatively excess. Place the blowtorch in the furnace cavity (5), the blowtorch is located on the central axis of the furnace cavity, the flame is downward, and the furnace cavity is heated. When the furnace cavity temperature reaches above 1500 ℃, the gas supply speed is adjusted to make the furnace cavity temperature stable. . The furnace cavity is maintained between 1500°C and 1800°C, preferably between 1550°C and 1700°C. Inert gases such as nitrogen can be intr...
Embodiment 2
[0062] Pre-deposition: as figure 1 As shown, quartz sand with an average particle size of 120 μm was charged into the hopper, and a slight sinusoidal vibration was applied to the hopper for use. Sequentially pass hydrogen and oxygen into the burner and ignite to form a hydrogen-oxygen flame. The flow rate of hydrogen is 55L / min and the flow rate of oxygen is 40L / min. The furnace is heated to 1700°C, and the carrier gas valve is opened to flow into the burner. The carrier gas is hydrogen. , the flow rate is 7L / min. After the air flow is stable, open the feeder, adjust the rotation speed of the feeding screw, control the feeding speed at 45g / min, and open the rotating bracket, the speed is 18rpm / min, and the quartz sand is gradually deposited on the substrate. and forming transparent quartz glass under the high temperature of the flame, after 15 minutes, a 12mm thick quartz base layer is formed on the substrate.
[0063] (a) Heating the quartz particles to partial melting to fo...
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