Method for preparing TiN or CrN film on surface of aluminum alloy through magnetron sputtering method

An aluminum alloy surface, magnetron sputtering technology, applied in sputtering plating, metal material coating process, ion implantation plating and other directions, can solve the problem of lack of preparation process parameters and standards, and achieve uniform and dense film structure, The effect of improving hardness, corrosion resistance, and bonding force

Active Publication Date: 2016-09-07
UNIV OF SCI & TECH LIAONING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, there are few reports on the preparation of TiN or CrN films on the surface of aluminum alloys at home and abroad, and there are no relevant preparation process parameters and standards for reference.

Method used

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  • Method for preparing TiN or CrN film on surface of aluminum alloy through magnetron sputtering method
  • Method for preparing TiN or CrN film on surface of aluminum alloy through magnetron sputtering method
  • Method for preparing TiN or CrN film on surface of aluminum alloy through magnetron sputtering method

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Embodiment 1

[0053] In this embodiment, a TiN film is prepared on the surface of 7A04 aluminum alloy by magnetron sputtering, and the working gas is argon and nitrogen with a purity of 99.99%.

[0054] Specific steps are as follows:

[0055] 1. Cutting the sample before coating: cutting Φ45mm×2mm aluminum alloy substrate;

[0056] 2. Pretreatment before sputtering: the sample is cleaned before coating, which is divided into two steps: external cleaning and internal cleaning;

[0057] 1) The specific steps for external cleaning are: put the aluminum alloy substrate in absolute ethanol, clean it with ultrasonic waves for 15-20 minutes, then place the aluminum alloy substrate in deionized water, clean it with ultrasonic waves for 20-25 minutes, and finally take out the aluminum alloy Substrate, dry quickly;

[0058] 2) The specific steps of internal cleaning are as follows: hang the aluminum alloy substrate into the chamber of the plasma-enhanced balanced magnetron sputtering equipment. Aft...

Embodiment 2

[0073] In this embodiment, a CrN film was prepared on the surface of 7A04 aluminum alloy by magnetron sputtering, and argon and nitrogen with a purity of 99.99% were selected as working gases;

[0074] Specific steps are as follows:

[0075] 1. Cut the sample before coating: cut the Φ50mm×3mm aluminum alloy substrate according to the required specifications;

[0076] 2. Pretreatment before sputtering: the sample is cleaned before coating, which is divided into two steps: external cleaning and internal cleaning;

[0077] 1) The specific steps for external cleaning are: put the aluminum alloy substrate in absolute ethanol, clean it with ultrasonic waves for 15-20 minutes, then place the aluminum alloy substrate in deionized water, clean it with ultrasonic waves for 20-25 minutes, and finally take out the aluminum alloy Substrate, dry quickly;

[0078] 2) The specific steps of internal cleaning are as follows: hang the aluminum alloy substrate into the chamber of the plasma-enh...

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Abstract

The invention discloses a method for preparing a TiN or CrN film on the surface of an aluminum alloy through a magnetron sputtering method, and relates to a device for utilizing plasma enhanced balanced magnetron sputtering. A Ti and Cr metal target is used, and the TiN film containing a Ti atomic transition layer and the CrN film containing a Cr atomic transition layer are prepared on the surface of the aluminum alloy. According to the method, the self strength of an aluminum alloy matrix is guaranteed, meanwhile, the hardness and corrosion resistance of the surface of the aluminum alloy are improved, the binding force of the films and the matrix is good, and important reference bases can be provided for an aluminum alloy surface modifying process.

Description

technical field [0001] The invention relates to the field of preparing thin films by a magnetron sputtering method, in particular to a method for preparing TiN or CrN thin films on the surface of a 7A04 aluminum alloy by using the magnetron sputtering method. Background technique [0002] 7A04 aluminum alloy has the characteristics of high strength and low density, and it is widely used in the aviation field. In order to improve the surface hardness and corrosion resistance of aluminum alloy, a hard film can be prepared on its surface. The hard film not only retains the original excellent properties of the base material, but also improves the mechanical properties, high temperature stability, corrosion resistance and wear resistance of the material. It can be said that the preparation of hard films on the surface of materials occupies an extremely important position in modern industrial production. [0003] Magnetron sputtering has been widely used as a preparation technol...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/06
CPCC23C14/0617C23C14/0641C23C14/352
Inventor 王亚男陈东旭陈琦周艳文张力元
Owner UNIV OF SCI & TECH LIAONING
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