Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing plateau-climate-resisting UV luminous ink

A technology of luminescent ink and plateau climate, applied in the direction of ink, luminescent materials, chemical instruments and methods, etc., can solve the problems of poor weather resistance, fading, yellowing, etc.

Inactive Publication Date: 2016-09-07
QINGHAI YAFENG COLOR PRINTING +1
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the weather resistance of UV outdoor printing inks currently used in the market is not good, especially on plateaus with strong ultraviolet rays and strong wind and sand. Generally, serious yellowing and color loss will occur within one year, which greatly limits the use of UV luminescent inks. Use in harsh outdoor conditions

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] This embodiment provides a preparation method of UV luminescent ink resistant to plateau climate, which includes the following steps.

[0041] (1) Preparation of luminescent materials;

[0042] ①Weigh 0.02molSrCO 3 , 0.02mol Al 2 o 3 , 0.00004mol Eu 2 o 3 , 0.00001molDy 2 o 3 , 0.000005molTb 4 o 7 , 0.00002molSiO 2 and 0.004molH 3 BO 3 As a raw material, grind the raw material in a mortar for 30 minutes, put the uniformly mixed material in a crucible and sinter for 2 hours under a weak reducing atmosphere at 1200 ° C to obtain Tb 3+ , Si 4+ Co-doped modified SrAl with a particle size of 76 μm 2 o 4 :Eu 2+ , Dy 3+ Powder. A weakly reducing atmosphere includes, for example, 5% H 2 +95%N 2 Atmosphere, 5%, 95% refer to the volume ratio. This embodiment uses Tb 3+ , Si 4+ Co-doped modified SrAl 2 o 4 :Eu 2+ , Dy 3+ , the particle size of the obtained long-lasting luminescent material is micron level, and does not need to be broken during use.

[00...

Embodiment 2

[0056] This embodiment provides a preparation method of UV luminescent ink resistant to plateau climate, which includes the following steps.

[0057] (1) Preparation of luminescent materials;

[0058] ①Weigh 0.02molSrCO 3 , 0.02mol Al 2 o 3 , 0.00004mol Eu 2 o 3 , 0.00001molDy 2 o 3 , 0.000005molTb 4 o 7 , 0.00002molSiO 2 and 0.004molH 3 BO 3 As a raw material, grind the raw material in a mortar for 25 minutes, place the uniformly mixed material in a crucible and sinter for 2.5 hours under a weak reducing atmosphere at 1200 ° C to obtain Tb 3+ , Si 4+ The particle size of the co-doped modified SrAl is 80 μm 2 o 4 :Eu 2+ , Dy 3+ Powder. A weakly reducing atmosphere includes, for example, 5% H 2 +95%N 2 Atmosphere, 5%, 95% refer to the volume ratio.

[0059] ②Weigh 0.02mol Sr(NO 3 ) 2 , 0.04mol Al(NO 3 ) 3 9H 2 O, 20ml HNO 3 , 0.004mol H 3 BO 3 , 0.18mol NH 2 CH 2 COOH, 0.00004mol Eu 2 o 3 , 0.00004mol Dy 2 o 3 For raw materials, dissolve comple...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the field of printing ink preparation and discloses a method for preparing plateau-climate-resisting UV luminous ink. A doping modified micron-scale SrAl2O4: EU<2+>, Dy<3+> long-lasting phosphor material is prepared through sintering; a nano-scale SrAl2O4:EU<2+>, Dy<3+> long-lasting phosphor material is prepared through burning and is applied to the luminous ink through grading, and nano ZnO modified polyacrylic resin, nano SiO2 modified polyacrylic resin and nano TiO2 modified polyacrylic resin are mixed and evenly stirred to obtain ZnO, SiO2 and TiO2 co-doped modified polyacrylic resin which serves as the prepolymer of the ink. The process is simple and easy to realize, and the prepared UV luminous ink is high in aging resistance and wear resistance and suitable for being used on outdoor printed products in plateau areas with strong ultraviolet light and dust storm.

Description

technical field [0001] The invention belongs to the field of ink preparation, in particular to a preparation method of plateau climate-resistant UV luminous ink. Background technique [0002] As the basic raw material of the modern printing industry, the development of ink is closely related to the development of the national economy and even closer to the development of the printing industry. Benefiting from the rapid development of the domestic printing industry, my country's ink consumption, consumption of consumables, and printing consumables such as paper and cardboard have maintained double-digit rapid growth. In 2013, my country's ink output was 615,000 tons, and it is expected to exceed 800,000 in 2015. The industry generally believes that my country's ink industry is in a golden period of development. However, my country is still a developing country, and the per capita consumption of printed matter is still very low, only 5% of the per capita consumption of develop...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C09D11/107C09D11/03C09K11/64
CPCC09D11/03C09D11/107C09K11/7792
Inventor 梁小平徐海刘凯王欢高红娇薛圣贤李军红
Owner QINGHAI YAFENG COLOR PRINTING
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com