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Preparation method of large-size, fine-grained molybdenum-tantalum alloy sputtering target

A sputtering target, large-scale technology, applied in the target field, can solve the problems of inability to use rolling production, high alloy temperature, target import, etc., to overcome poor dimensional accuracy, uniform grain distribution, and difficult to bubble. and the effect of segregation defects

Active Publication Date: 2017-11-24
ACHEMETAL TUNGSTEN & MOLYBDENUM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But so far, there is still no professional large company specializing in the production of target materials in China, and a large number of target materials are still imported from abroad
Especially for alloy targets, the alloy has high temperature and low plasticity, so it cannot be produced by rolling

Method used

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  • Preparation method of large-size, fine-grained molybdenum-tantalum alloy sputtering target

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preparation example Construction

[0025] The method for preparing a large-size, fine-grained molybdenum-tantalum alloy sputtering target comprises the following steps: step 1, pretreating molybdenum powder and tantalum powder and then sieving respectively, the Fischer particle size of tantalum powder and molybdenum powder after sieving The ratio is 1.6:1, and the sieved molybdenum powder and tantalum powder are ball milled and mixed according to the mass ratio of 90~94:6~10 for more than 16 hours, and the molybdenum-tantalum mixed powder is prepared for use;

[0026] Step 2. According to the target size of the required compact, weigh the mass or volume of the molybdenum-tantalum mixed powder required to form a compact, and make a cold isostatic pressing mold with the same volume as the molding cavity and the molybdenum-tantalum mixed powder , using a powder feeder to make the molybdenum-tantalum mixed powder freely fall into the forming cavity of the cold isostatic pressing mold. Blank, spare;

[0027] Step 3...

Embodiment 1

[0034] The preparation method of large-size, fine-grained molybdenum-tantalum alloy sputtering target material comprises the following steps: step 1, pretreating molybdenum powder and tantalum powder and then sieving respectively, the Fischer particle size of tantalum powder after sieving is 9.6 microns , the Fischer particle size of the molybdenum powder is 6 microns, and the molybdenum powder and tantalum powder after sieving are ball-milled and mixed according to a mass ratio of 94:6 for 16 hours to obtain a molybdenum-tantalum mixed powder for subsequent use; wherein, the pretreatment method is: Molybdenum powder and tantalum powder were annealed under vacuum condition for 2h, and the annealing temperature was 1300°C.

[0035] Step 2. According to the target size of the required compact, weigh the mass or volume of the molybdenum-tantalum mixed powder required to form a compact, and make a cold isostatic pressing mold with the same volume as the molding cavity and the molyb...

Embodiment 2

[0042] The preparation method of large-size, fine-grained molybdenum-tantalum alloy sputtering target material comprises the following steps: step 1, pretreating molybdenum powder and tantalum powder and then sieving respectively, the Fischer particle size of tantalum powder after sieving is 16 microns , the Fischer particle size of the molybdenum powder is 10 microns, and the molybdenum powder and tantalum powder after sieving are ball-milled and mixed according to the mass ratio of 90:10 for 20 hours, and the molybdenum-tantalum mixed powder is prepared for subsequent use; the pretreatment method is: Molybdenum powder and tantalum powder were annealed under vacuum condition for 2h, and the annealing temperature was 1300°C.

[0043] Step 2. According to the target size of the required compact, weigh the mass or volume of the molybdenum-tantalum mixed powder required to form a compact, and make a cold isostatic pressing mold with the same volume as the molding cavity and the mo...

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Abstract

A preparation method of a large-size and fine-grain molybdenum tantalum alloy sputtering target material comprises steps of cold isostatic pressing molding through combination of a steel mold with a rubber plate, sintering, levelling and reshaping, hot isostatic pressing treatment, rolling and machining. The grain size of the produced target material is smaller than 50 microns, the change of the grain size is maintained within 20%, and grains are evenly distributed in the plane direction and the thickness direction of the target material; the relative density of the target material is higher than 97%; besides, the large-size sputtering target material with the length being about 2 m and the width being about 1.3 m can be produced.

Description

technical field [0001] The invention relates to the technical field of targets, in particular to a method for preparing large-sized, fine-grained molybdenum-tantalum alloy sputtering targets. Background technique [0002] Sputtering is one of the main techniques for preparing thin film materials. The accelerated ions are used to bombard the solid surface, and the ions and solid surface atoms exchange momentum, so that the atoms on the solid surface leave the solid and deposit on the substrate surface. This process is called sputtering. The solid being bombarded is the source material for sputtering thin films, often called the target. [0003] The film deposited by sputtering with the target has high density and good adhesion to the substrate. Sputtering thin film materials have been widely used in semiconductor integrated circuits, recording media, flat display and surface coating of workpieces. Therefore, the demand for sputtering targets, a functional material with hig...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34B22F3/04B22F3/15
CPCB22F3/04B22F3/15B22F2998/10C23C14/3414B22F3/10B22F3/24
Inventor 耿宏安
Owner ACHEMETAL TUNGSTEN & MOLYBDENUM
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