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ITO-Ag-ITO etching liquid for AMOLED

An etching solution, ito-ag-ito technology, applied in the direction of surface etching composition, chemical instrument and method, etc., can solve the problem of poor etching stability and other problems

Active Publication Date: 2016-04-06
JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Volatilization of acetic acid eventually leads to poor etching stability

Method used

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  • ITO-Ag-ITO etching liquid for AMOLED

Examples

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Comparison scheme
Effect test

Embodiment 1

[0028] The components of the ITO-Ag-ITO etchant for AMOLED in Example 1 (corresponding to S1 in the table, the same below) include by weight percent: 3% by weight of nitric acid, 25% by weight of acetic acid, 60% by weight of phosphoric acid and soluble A mixture of orthophosphate, 5% additive, and deionized water in the balance; the additive is sodium nitrate. Soluble orthophosphate is sodium phosphate.

[0029] The weight percent of sodium phosphate in the mixture of phosphoric acid and sodium phosphate is 5%.

Embodiment 2

[0031] The difference between embodiment 2 and embodiment 1 is: the components of the ITO-Ag-ITO etchant for AMOLED in embodiment 2 include by weight percentage: 10% by weight of nitric acid, 10% by weight of acetic acid, 30% by weight of phosphoric acid and soluble orthophosphate, 1% additive, the balance deionized water; additives are potassium nitrate and ammonium nitrate. Soluble orthophosphate is sodium phosphate.

[0032] The weight percent of sodium phosphate in the mixture of phosphoric acid and sodium phosphate is 30%.

Embodiment 3

[0034] The difference between embodiment 3 and embodiment 1 is: the component of AMOLED ITO-Ag-ITO etchant comprises by weight percent: the nitric acid of 6% by weight, the acetic acid of 18% by weight, the phosphoric acid of 48% by weight and soluble orthophosphoric acid A mixture of salt, 2% by weight of additives, and the balance of deionized water; the additive is a 1:1 mixture of sodium nitrate and potassium nitrate. Soluble orthophosphate is sodium phosphate.

[0035] The weight percent of sodium phosphate in the mixture of phosphoric acid and sodium phosphate is 5%.

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Abstract

The invention discloses ITO-Ag-ITO etching liquid for an AMOLED. The liquid comprises, by weight percentage, 3% to 10% of nitric acid, 10% to 25% of acetic acid, 30% to 60% of a mixture of phosphoric acid and soluble orthophosphate, 1% to 5% of an additive and the balance deionized water, wherein the additive comprises nitrate. The soluble orthophosphate is added so that the viscosity of the etching liquid can be properly increased, it is guaranteed that the etched surface has the reasonable reactant and product concentration gradient in the etching process, and compared with the prior art, the silver etching speed can be properly reduced, the even etching effect can be achieved, and the controllable electrode shape is obtained; and decomposition of the acetic acid, the nitric acid and nitrous acid in the etching process can be remarkably reduced, and environment-friendly production of the etching process can be achieved conveniently.

Description

technical field [0001] The invention relates to the technical field of etching solution compositions, in particular to an ITO-Ag-ITO etching solution for AMOLED. Background technique [0002] AMOLED (Active-matrixorganic light emitting diode) screen structure has three layers, AMOLED screen, TouchScreenPanel (touch screen panel), outer protective glass. AMOLED is a kind of OLED technology. The principle of OLED light emission is to use ITO transparent electrode and metal electrode as the anode and cathode of the device respectively. Under a certain voltage drive, electrons and holes are injected from the cathode and anode to the electron and hole transport layers respectively. Electrons and holes migrate to the light-emitting layer through the electron and hole transport layers respectively, and meet in the light-emitting layer to form excitons and excite light-emitting molecules, which emit visible light through radiation relaxation. A transflective high-conductivity thin ...

Claims

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Application Information

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IPC IPC(8): C23F1/30C09K13/06
CPCC09K13/06C23F1/30
Inventor 栾成殷福华邵勇赵文虎李英朱龙顾玲燕
Owner JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL
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