Uniform discharge low-temperature plasma fabric processing device and method under intelligent atmospheric pressure

A low-temperature plasma and fabric treatment technology, applied in physical treatment, fiber treatment, ultrasonic/sonic fiber treatment, etc., can solve the problems of inaccurate control of the discharge energy, uneven plasma density, and failure to reach the tension. Achieve the effect of improving production efficiency and product quality, high discharge density and short process

Active Publication Date: 2016-03-30
NANJING SUMAN PLASMA TECH CO LTD
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Although plasma technology has been widely used, for the material treatment of some special fabrics, there will be a certain probability that the surface treatment will be uneven and the required tension will not be reached. It is caused by the weak point, the small processing area, or the inaccurate control of the discharge energy
And before the fabric is processed, technicians are often required to do a large number of small-scale experiments, constantly repeating work, which greatly wastes manpower and financial resources

Method used

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  • Uniform discharge low-temperature plasma fabric processing device and method under intelligent atmospheric pressure
  • Uniform discharge low-temperature plasma fabric processing device and method under intelligent atmospheric pressure
  • Uniform discharge low-temperature plasma fabric processing device and method under intelligent atmospheric pressure

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Embodiment Construction

[0024] In order to clarify the technical scheme and technical purpose of the present invention, the present invention will be further introduced below in conjunction with the accompanying drawings and specific embodiments.

[0025] Such as Figure 1 to Figure 3 The shown intelligent uniform discharge low-temperature plasma fabric treatment equipment under atmospheric pressure includes a main body chassis, a sound insulation cooling device 2, and power cabinets 5 and control cabinets respectively located on the left and right sides of the main chassis. The control cabinet is provided with a touch screen 9, a tension controller 10, a power input terminal 11 and the like.

[0026] A base 24 and an equipment data connection interface 24 are provided below the main chassis, and an active discharge roller 20, four corundum electrode groups 16 symmetrically arranged around the active discharge roller 20, several fabric guide rollers 14, emergency stop Switch 13, balance pull bar 18 ...

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Abstract

The invention relates to a uniform discharge low-temperature plasma fabric processing device under intelligent atmospheric pressure. The uniform discharge low-temperature plasma fabric processing device under the intelligent atmospheric pressure comprises a main case and a cooling device, wherein a driving discharge roller and a fabric guide roller are arranged in the main case; a plurality of electrode groups are distributed surrounding the periphery of the driving discharge roller; the electrode groups are controlled by a drive mechanism to adhere the driving discharge roller or separate from the driving discharge roller; a laser sensor for detecting fabric joints or foreign matters is arranged on one end of the inlet of the driving discharge roller; automatic liquid dripping needle tubes and camera devices for acquiring water drop angle images are respectively arranged on one end of the inlet and one end of the outlet of the driving discharge roller; the drive mechanism, the laser sensor and the camera devices are respectively connected with a control system. According to the uniform discharge low-temperature plasma fabric processing device under the intelligent atmospheric pressure provided by the invention, the fabric is put in a continuously uniform electric field, so that the damage on the surface of the fabric due to uneven discharge can be effectively avoided; meanwhile, water drop angle data analyses are automatically carried out before and after processing, and the tension of the surface of the fabric after processing is intelligently controlled, so that the working efficiency and the processing yield are remarkably improved.

Description

technical field [0001] The invention relates to the technical field of fabric treatment, in particular to a low-temperature plasma fabric treatment device and method. Background technique [0002] Low-temperature plasma technology is a material surface modification technology developed rapidly in recent years, which can improve the physical and chemical properties of the material surface without affecting the performance of the material matrix. As a clean and environmentally friendly treatment technology, it has been widely used to improve the wettability, dyeability, printability, biocompatibility and bonding properties of polymer materials with resin matrix. Among all kinds of plasma processing equipment, atmospheric pressure plasma processing technology will become the industrial development direction of plasma technology in the future because it does not need complex and expensive vacuum equipment and can realize continuous processing. As a new method of fabric modifica...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D06M10/02
CPCD06M10/025
Inventor 万良庆张凯
Owner NANJING SUMAN PLASMA TECH CO LTD
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