Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photocurable resin composition

A resin composition and post-curing technology, applied in the field of light post-curable resin compositions, can solve the problems of deterioration of light-emitting properties, deterioration of components, shortening of life, etc.

Active Publication Date: 2017-10-17
SEKISUI CHEM CO LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, such an organic EL display element has a problem that if the organic light-emitting material layer and electrodes are exposed to outdoor air, the light-emitting characteristics will deteriorate rapidly and the life will be shortened.
However, there is a problem that when a photocurable adhesive is used in this way, degassing occurs when light is irradiated and the inside of the device is filled, which accelerates the deterioration of the device.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photocurable resin composition
  • Photocurable resin composition
  • Photocurable resin composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0084] 50 parts by weight of bisphenol F type epoxy resin (manufactured by DIC Corporation, "EPICLON EXA-830LVP"), 25 parts by weight of hydrogenated bisphenol A type epoxy resin (manufactured by Mitsubishi Chemical Corporation, "jER YL8034") Parts by weight, and 25 parts by weight of hydrogenated bisphenol F-type epoxy resin (manufactured by Mitsubishi Chemical Corporation, "jER YL6753"), aromatic sulfonium salt as a photocationic polymerization initiator (manufactured by Midori Kagaku, "DTS-200") 1.0 parts by weight, 5 parts by weight of triglycidyl isocyanurate (manufactured by Nissan Chemical Co., Ltd., "TEPIC") as a compound having a tertiary amino group and a cationic polymerizable functional group, 2,4-diethylene glycol as a sensitizer 0.01 part by weight of thioxanthone (manufactured by Nippon Kayaku Co., Ltd., "DETX-S"), γ-glycidoxypropyltrimethoxysilane (manufactured by Shin-Etsu Silicone Co., Ltd., "KBM-403") as a silane coupling agent ") and 1 part by weight of a f...

Embodiment 2～6、 comparative example 1～3

[0086] According to the compounding ratio of Table 1, each material described in Table 1 was stirred and mixed similarly to Example 1, and the photopost-curable resin composition was produced.

[0087]

[0088] The following evaluations were performed about each photopost-curable resin composition obtained in the Example and the comparative example. The results are shown in Table 1.

[0089] (1) Viscosity

[0090] About each photopost-curable resin composition obtained by the Example and the comparative example, the viscosity in 25 degreeC and conditions of 100 rpm was measured using the E-type viscometer (made by Toki Sangyo Co., Ltd., "VISCOMETER TV-22").

[0091] (2) Curing delay

[0092] Using an ultraviolet irradiation device (manufactured by Oak Corporation, "JL-4300-3S"), 1500 mJ / cm was irradiated to the test pieces of each photo-post-curable resin composition obtained in Examples and Comparative Examples 2 of ultraviolet light. Curability was confirmed after 10 m...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The purpose of the present invention is to provide a photo-post-curing resin composition that makes it possible to suppress the generation of outgas and has exceptional transparency and reliability. The present invention is a photo-post-curing resin composition containing a cationically curable resin, a photo-cationic polymerization initiator, and a compound having amino groups and cationically polymerizable functional groups.

Description

technical field [0001] The present invention relates to a photopost-curable resin composition capable of suppressing the occurrence of outgassing and excellent in transparency and reliability. Background technique [0002] In recent years, research on organic light-emitting devices using organic thin-film elements such as organic electroluminescence (organic EL) display elements and organic thin-film solar cell elements is ongoing. An organic thin film element can be easily produced by vacuum deposition, solution coating, etc., and thus is also excellent in productivity. [0003] An organic EL display element has a thin-film structure in which an organic light-emitting material layer is sandwiched between a pair of electrodes facing each other. In this organic light-emitting material layer, electrons are injected from one electrode and holes are injected from the other electrode, whereby electrons and holes are combined in the organic light-emitting material layer to perfor...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08G59/20C08G59/68C08L63/00
CPCC08G59/20C08G59/68C08G2650/24C08L63/00
Inventor 渡边康雄七里德重
Owner SEKISUI CHEM CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com