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Device system and preparation technology for preparing submicron material through continuous hydrothermal method

A technology for submicron preparation and preparation process, applied in chemical instruments and methods, phosphorus compounds, inorganic chemistry, etc., can solve the problems of immature process technology, easy agglomeration, and low crystallization efficiency

Active Publication Date: 2015-10-21
ZHANGJIAGANG HEZHI NANO TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The invention provides a device system for preparing submicron materials by a continuous hydrothermal method and a preparation process thereof. The device system and the preparation process solve the problem of immature devices and process technologies for preparing submicron materials by a continuous hydrothermal method and low crystallization efficiency , easy to agglomerate and other problems, suitable for industrial continuous hydrothermal production of submicron materials

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  • Device system and preparation technology for preparing submicron material through continuous hydrothermal method
  • Device system and preparation technology for preparing submicron material through continuous hydrothermal method
  • Device system and preparation technology for preparing submicron material through continuous hydrothermal method

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preparation example Construction

[0034] A preparation process for preparing submicron materials by continuous hydrothermal method, the process comprises the following steps:

[0035] The first raw material liquid contained in the first batching kettle 1 is transported by the first feed pump 3 and then enters the preheater 5 to preheat to a certain temperature, and the second raw material liquid contained in the second batching kettle 2 passes through the second feeding pump 4 Transport and enter the first crystallizer 6 according to a certain volume ratio with the preheated first raw material liquid to obtain a slurry, which flows in the first crystallizer 6 at a certain flow rate for a period of time before entering the second crystallization device 6;

[0036] The slurry enters the second crystallizer 6 for crystallization, and part of the slurry flows out from the discharge port of the second crystallizer 6, exchanges heat through the heat exchanger 9, and is driven by the circulation pump 10 and is connec...

Embodiment 1

[0046] Taking the preparation of submicron titanium dioxide by sulfuric acid method as an example, the preparation process of submicron titanium dioxide by continuous hydrothermal method is as follows:

[0047] The first raw material liquid is a titanium sulfate liquid precursor solution, and the second raw material liquid is an aqueous solution. TiO in titanium sulfate liquid precursor solution 2 Concentration 260g / L, acidity coefficient F value (effective acid and total TiO 2 The concentration ratio) is 2.0, the iron-to-titanium ratio (the ratio of the concentration of iron ions in the titanium solution to the total titanium concentration) is 0.21, the stability of the titanium solution is >500, the clarity is good, and the temperature is 40°C. The outlet temperature of the preheated water through the preheater 5 is 125°C, the volume ratio of the titanium sulfate liquid precursor solution entering the first crystallizer 6 and the preheated water is 1:4, and the pipe diamete...

Embodiment 2

[0050] The preparation process of submicron titanium dioxide prepared by continuous hydrothermal method is as follows:

[0051] The first raw material liquid is a titanium sulfate liquid precursor solution, and the second raw material liquid is an aqueous solution. TiO in titanium sulfate liquid precursor solution 2 Concentration 300g / L, acidity coefficient F value (effective acid and total TiO 2 The concentration ratio) is 1.8, the iron-to-titanium ratio (the ratio of the concentration of iron ions in the titanium solution to the total titanium concentration) is 0.21, the stability of the titanium solution is >500, the clarity is good, and the temperature is 30°C. The outlet temperature of the preheated water through the preheater 5 is 180°C, the volume ratio of the titanium sulfate liquid precursor solution entering the first crystallizer 6 and the preheated water is 1:1, and the pipe diameter of the first crystallizer 6 It is DN125. The flow rate of the precursor solutio...

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Abstract

The invention provides a device system and preparation technology for preparing a submicron material through a continuous hydrothermal method. The device system comprises burdening kettles, a preheater, a first crystallizer and a second crystallizer. The first burdening kettle is communicated with the first crystallizer through a first feeding pump and the preheater, and the second burdening kettle is communicated with the first crystallizer through a second feeding pump. The first crystallizer is communicated with the second crystallizer, a discharging opening of the second crystallizer is communicated with an inlet of a heat exchanger, one outlet of the heat exchanger is communicated with an outer circulating unit and then communicated with an inlet of the second crystallizer, and the other outlet of the heat exchanger is communicated with an aftertreatment unit and a slurry collector. The first crystallizer is a tubular reaction crystallizer, and the second crystallizer is a continuous crystallizer. The device system is adopted in the preparation technology. According to the device system and preparation technology, the device cost is low, meanwhile, the submicron material with even particle size distribution and the high degree of crystallinity can be prepared continuously, and the device system and preparation technology are suitable for industrial production.

Description

technical field [0001] The invention relates to a liquid-phase preparation process for submicron materials, in particular to a device system for preparing submicron materials by a continuous hydrothermal method and a preparation process thereof. Background technique [0002] Ultrafine powder technology is a new discipline developed in the mid-1970s. Ultrafine powder is used in almost all industries of the national economy. It is the basis for transforming and promoting the development of emerging industries such as paint and coatings, information recording media, fine ceramics, electronic technology, new materials, and biotechnology. It is the starting point of modern high-tech and has increasingly become the focus of research in various countries. With the superfineness of the material, its surface electronic structure and crystal structure have changed, resulting in surface effects, small size effects, quantum effects and macroscopic quantum tunneling effects that bulk mat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G23/053C01B25/45
CPCB01D9/02C01B25/00C01B25/45C01G23/047C01G23/053
Inventor 徐程浩杨德建
Owner ZHANGJIAGANG HEZHI NANO TECH CO LTD
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