Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Glass substrate cleaning method

A glass substrate and cleaning liquid technology, applied in chemical instruments and methods, detergent compositions, detergent compounding agents, etc., can solve the problems of insufficient cleaning performance, inability to fully remove abrasive residues, etc., and achieve the effect of preventing peeling

Inactive Publication Date: 2015-07-15
ASAHI GLASS CO LTD +1
View PDF10 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Then, for such residues of abrasives with cerium oxide particles as abrasive grains, for example, when using an alkaline cleaning solution containing inorganic or organic alkali components and surfactants, the cleaning performance is not sufficient, and the particle diameter cannot be sufficiently removed. Sub-micron abrasive residue

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Glass substrate cleaning method
  • Glass substrate cleaning method
  • Glass substrate cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0069] In Examples 1 and 2, when the composition is recorded as 100 parts, an acidic compound containing 9.0 parts of organic phosphonic acid, 1.0 part of polycarboxylic acid salt, 10.0 parts of aromatic sulfonic acid and 1.0 part of amine-alkylene oxide, and the rest is water. Cleaning agent stock solution (manufactured by Parker Co., Ltd., trade name; PK-LCG491A) was diluted with water so that the concentration of the stock solution (including water) became 0.5%, and the obtained acidic cleaning solution (pH 2.3 to 2.8) was The surface of the polished glass substrate was sprayed at a flow rate of 25 L (hereinafter referred to as cleaning liquid flow rate) within 1 minute, while scrubbing with a rotating PVA brush, followed by acid cleaning and alkali cleaning. Alkaline cleaning was carried out by diluting the stock solution of alkaline cleaning agent (manufactured by Parker, trade name; PK-LCG211) with water so that the concentration of the stock solution (including water) be...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A method for cleaning a glass substrate after polishing, wherein a decrease in adhesion performance of a resin BM film formed on the cleaned glass substrate surface is suppressed and peeling of the resin BM film is prevented. A glass substrate cleaning method, characterized in that a glass substrate polished using a polishing agent containing cerium oxide particles is washed using an acidic aqueous cleaning liquid containing an organic acid and then washed using an alkaline aqueous cleaning liquid containing a base.

Description

technical field [0001] The present invention relates to a cleaning method for cleaning a glass substrate polished with an abrasive containing cerium oxide particles, and particularly relates to a cleaning method for cleaning a glass substrate for a liquid crystal display device or the like. Background technique [0002] For glass substrates used in FPDs (Flat Panel Displays) such as liquid crystal displays (LCDs), for example, glass substrates formed into a plate shape from molten glass are ground with a grinding tool that rotates and revolves to remove fine particles on the surface. Concave-convex and waviness are formed into a thin plate shape with a predetermined thickness (for example, 0.4 to 1.1 mm) satisfying the flatness required for a glass substrate for FPD. [0003] In the grinding of such glass substrate, use the abrasive (slurry) that contains cerium oxide particle as abrasive grain, after grinding, implement and utilize cleaning liquid to clean and remove the ab...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C23/00C11D1/44C11D3/20C11D3/34C11D3/36G02F1/1333
CPCC11D3/362C11D3/20C03C23/00C11D3/34C11D11/0064C11D11/0035C11D3/044C11D3/3418C11D1/44C11D11/0041C11D3/2082C11D3/36C03C23/0075C11D2111/18C11D2111/44C11D2111/20
Inventor 榎本久男佐原幸治石川智章城山厚前柳佳孝竹中敦义小林大介高桥秀幸中岛阳司
Owner ASAHI GLASS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com