Graphite surface titanium metallization method and product manufactured with the same
A technology of titanium metal and graphite, which is applied in the field of titanium metallization on the surface of graphite and its preparation products, can solve the problems of difficult connection, large difference in expansion coefficient, elastic modulus, and low bonding strength of the titanium metallized layer and film base. Achieve the effect of easy quality control and good process repeatability
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Embodiment 1
[0025] The graphite substrate workpiece after vacuum degassing treatment is placed in the magnetron sputtering chamber, and 99.9wt% pure titanium is used as the target material. The process conditions for depositing titanium are: target distance 25mm, deposition time 40min, sputtering power 100W , bias voltage 50V, vacuum degree 0.5Pa. After the magnetron sputtering is completed, a layer of titanium film is formed on the surface of the graphite substrate.
[0026] Then place the graphite matrix workpiece with the titanium film deposited in the hot isostatic pressing equipment for processing, that is, place the graphite matrix workpiece coated with the titanium film in the hot isostatic pressing equipment for heating and pressurization. The treatment process is as follows: the working temperature is 900°C, the working pressure is 40MPa, and the holding time is 5min. After the hot isostatic pressing is completed, cool to room temperature, take out the workpiece, and form a laye...
Embodiment 2
[0028] The graphite substrate is placed in a sintering furnace for vacuum degassing treatment, the sintering temperature is 1400°C, and the vacuum degree is 1×10 -3 Pa, keep warm for 2 hours, cool to room temperature, then ultrasonically clean with distilled water, dehydrate with acetone and blow dry.
[0029] Then place the graphite substrate workpiece after vacuum degassing treatment in the magnetron sputtering chamber, use 99.9% pure titanium as the target material, and the process conditions for depositing titanium are: target distance 35mm, deposition time 60min, sputtering power 120W , bias voltage 100V, vacuum degree 1Pa. After the magnetron sputtering is completed, a layer of titanium film is formed on the surface of the graphite substrate.
[0030] Then place the graphite substrate workpiece with the titanium film deposited in the hot isostatic pressing equipment for processing, that is, place the graphite workpiece coated with the titanium film in the hot isostatic ...
Embodiment 3
[0032] The graphite substrate workpiece after vacuum degassing treatment is placed in the magnetron sputtering chamber, and 99.9% pure titanium is used as the target material. The process conditions for depositing titanium are: target distance 40mm, deposition time 100min, sputtering power 150W, Bias voltage 150V, vacuum degree 1.5Pa. After the magnetron sputtering is completed, a layer of titanium film is formed on the surface of the graphite substrate.
[0033] Then place the graphite substrate workpiece with the titanium film deposited in the hot isostatic pressing equipment for processing, that is, place the graphite workpiece coated with the titanium film in the hot isostatic pressing equipment for heating and pressurization. The treatment process is as follows: the working temperature is 1000°C, the working pressure is 200MPa, and the holding time is 30min. After the hot isostatic pressing is completed, cool to room temperature, take out the workpiece, and form a layer ...
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