Bi[0.92-x]Ho0.08AExFe0.97Mn0.03O3 multiferroic film and preparation method thereof
A multiferroic, thin-film technology, applied in coatings and other directions, can solve the problems of limited BFO application, difficult hysteresis loop measurement, weak BFO magnetic properties, etc., to reduce defects, improve magnetoelectric properties, and reduce content.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0029] Step 1. The molar ratio is 0.96:0.08:0.01:0.97:0.03. Dissolve bismuth nitrate, holmium nitrate, calcium nitrate, ferric nitrate, and manganese nitrate in a solvent (AE=Ca, x=0.01, excess 5% bismuth nitrate) , To obtain a stable Bi with a total concentration of metal ions of 0.3 mol / L 0.91 Ho 0.08 Ca 0.01 Fe 0.97 Mn 0.03 O 3 Precursor liquid; the solvent is a mixture of ethylene glycol methyl ether and acetic anhydride with a volume ratio of 3:1;
[0030] Step 2. Choose the FTO / glass substrate as the substrate, place the substrate in detergent, acetone, and ethanol in sequence, and clean the substrate with ultrasonic for 10 minutes, then clean the substrate with distilled water and dry it with nitrogen; then place it in an oven at 60℃ Medium bake for 5 minutes, then take it out and let it stand to room temperature; finally, place the substrate in an ultraviolet irradiator for 40 minutes to make the surface of the substrate reach "atomic cleanliness". Spin coating Bi on clea...
Embodiment 2
[0039] Step 1. The molar ratio is 0.94:0.08:0.03:0.97:0.03. Dissolve bismuth nitrate, holmium nitrate, calcium nitrate, ferric nitrate, and manganese nitrate in a solvent (AE=Ca, x=0.03, excess 5% bismuth nitrate) , To obtain a stable Bi with a total concentration of metal ions of 0.003mol / L 0.89 Ho 0.08 Ca 0.03 Fe 0.97 Mn 0.03 O 3 Precursor liquid; the solvent is a mixture of ethylene glycol methyl ether and acetic anhydride with a volume ratio of 2.5:1;
[0040] Step 2. Choose the FTO / glass substrate as the substrate, place the substrate in detergent, acetone, and ethanol in sequence, and clean the substrate with ultrasonic for 10 minutes, then clean the substrate with distilled water and dry it with nitrogen; then place it in an oven at 60℃ Medium bake for 5 minutes, then take it out and let it stand to room temperature; finally, place the substrate in an ultraviolet irradiator for 40 minutes to make the surface of the substrate reach "atomic cleanliness". Spin coating Bi on c...
Embodiment 3
[0043] Step 1. The molar ratio is 0.92:0.08:0.05:0.97:0.03. Dissolve bismuth nitrate, holmium nitrate, calcium nitrate, iron nitrate, and manganese nitrate in a solvent (AE=Ca, x=0.05, excess 5% bismuth nitrate) , To obtain a stable Bi with a total concentration of metal ions of 0.01 mol / L 0.87 Ho 0.08 Ca 0.05 Fe 0.97 Mn 0.03 O 3 Precursor; the solvent is a mixture of ethylene glycol methyl ether and acetic anhydride with a volume ratio of 3.5:1;
[0044] Step 2. Choose the FTO / glass substrate as the substrate, place the substrate in detergent, acetone, and ethanol in sequence, and clean the substrate with ultrasonic for 10 minutes, then clean the substrate with distilled water and dry it with nitrogen; then place it in an oven at 60℃ Medium bake for 5 minutes, then take it out and let it stand to room temperature; finally, place the substrate in an ultraviolet irradiator for 40 minutes to make the surface of the substrate reach "atomic cleanliness". Spin coating Bi on clean FTO / ...
PUM
Property | Measurement | Unit |
---|---|---|
Leakage current density | aaaaa | aaaaa |
Remanent polarization | aaaaa | aaaaa |
Coercive field | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com