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Method for manufacturing X-ray lens high in height-width ratio

An X-ray and lens technology, applied in the field of X-ray lens preparation, can solve problems such as difficult processing of capillary mirrors, and achieve the effect of good consistency and stable process conditions

Inactive Publication Date: 2015-03-25
FUDAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In traditional X-ray microscopes, capillary mirrors are generally used as samples to provide lenses with uniform light intensity, but the processing of capillary mirrors is difficult. In the present invention, a method compatible with IC production technology is provided to prepare X-ray lenses

Method used

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  • Method for manufacturing X-ray lens high in height-width ratio
  • Method for manufacturing X-ray lens high in height-width ratio
  • Method for manufacturing X-ray lens high in height-width ratio

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] Embodiment 1: Making an X-ray lens with a high aspect ratio:

[0049] (1) Use quartz glass as the base material;

[0050] (2) Deposit 10nm / 10nm Cr / Au as a conductive metal layer on the substrate by physical vapor deposition, such as figure 1 shown;

[0051] (3) Spray a layer of HMDS on the substrate with a metal layer as an adhesion layer, then throw a layer of 1.5um PMMA photoresist, and bake it at 180°C for 1 hour. The results are as follows: figure 2 shown;

[0052] (4) Expose the sample under the electron beam exposure machine;

[0053] (5) Develop the exposed sample with 1:3 MIBK and IPA, the time is 1 minute, the development temperature is 23°C; and wash in IPA for 30 seconds, the result is as follows image 3 shown;

[0054] (6) Electroplate Au on the surface of the developed sample with nano-electroplating technology. The electroplating conditions are: PH: 8.5, temperature 50°C, current density 0.3ASD, and electroplating time 30 minutes. The results are a...

Embodiment 2

[0057] Embodiment 2: Preparation of a single nanocolumn pattern with a high aspect ratio applied to hard X-rays:

[0058] (1) Select a diaphragm with silicon nitride as the base material;

[0059] (2) Deposit 10nm / 10nm Cr / Au as a conductive metal layer on the substrate by physical vapor deposition, such as Figure 7 shown;

[0060](3) Spray a layer of HMDS as an adhesion layer on the substrate with a metal layer, and then throw a layer of 2.5um PMMA photoresist, and bake it at 180°C for 1 hour. The result is as Figure 8 shown;

[0061] (4) Expose the sample under the electron beam exposure machine;

[0062] (5) Develop the exposed sample with 1:3 MIBK and IPA for 1 minute at a developing temperature of 23°C; and wash in IPA for 30 seconds. The result is as Figure 9 shown;

[0063] (6) Use nano-plating technology to electroplate Au on the surface of the developed sample. The electroplating conditions are: PH: 8.5, temperature 50°C, current density 0.3ASD, and electropl...

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Abstract

The invention belongs to the technical field of electron beam lithography processing and particularly relates to a method for manufacturing an X-ray lens high in height-width ratio. The method comprises the steps that on a substrate or a membrane with a metal seed layer deposited, a design pattern of an X-ray convergent lens is prepared on photoresist through an electron beam lithography technology; then, a condenser structure high in height-width ratio is obtained through a nanometer electroplating technology; finally, the photoresist is dissolved through an organic solution such as acetone, and thus the condenser lens which is high in height-width ratio and is applied to the X-ray imaging field is obtained.

Description

technical field [0001] The invention belongs to the technical field of nano-processing, and in particular relates to a preparation method of an X-ray lens. Background technique [0002] X-rays have a short wavelength and a large penetration depth, which not only has the potential for nano-resolution imaging of thick samples, but also has a variety of imaging mechanisms (such as absorption, phase, fluorescence, etc.), and rich sources of contrast, so it can observe and analyze a variety of microscopic physics. , chemical and nanostructures, to achieve the observation of the internal three-dimensional structure of thicker substances, and has a wide range of applications in biomedicine and material science, so X-ray microscopic imaging technology has attracted more and more attention. Therefore, in X-ray microscopy, it is necessary to provide uniform irradiation conditions for the sample. [0003] In traditional X-ray microscopes, capillary mirrors are generally used as sample...

Claims

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Application Information

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IPC IPC(8): G21K1/06B82Y40/00
CPCG21K1/062B82Y40/00G21K2201/061
Inventor 陈宜方刘建朋邵金海陆冰睿
Owner FUDAN UNIV
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