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Lithography apparatus with segmented mirror

A technology of lithography equipment and mirrors, applied in microlithography exposure equipment, optomechanical equipment, optics, etc., can solve problems such as large cost and space requirements

Active Publication Date: 2015-03-18
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This means that, for example, in the case of four mirror segments, a total of 24 sensors must be provided, which entails considerable expense and space requirements

Method used

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  • Lithography apparatus with segmented mirror
  • Lithography apparatus with segmented mirror
  • Lithography apparatus with segmented mirror

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Embodiment Construction

[0036] figure 1 A schematic diagram of an EUV lithography apparatus 100 according to an embodiment is shown, which includes a beam shaping system 102, an illumination system 104, and a projection system 106. The beam shaping system 102, the illumination system 104, and the projection system 106 are respectively arranged in a vacuum housing, and the vacuum housing can be evacuated by means of a vacuuming device (not shown in more detail). The vacuum housing is surrounded by a machine room (not shown in more detail) in which, for example, a driving device for mechanically moving and / or adjusting the optical element is provided. In addition, an electric controller and the like can also be provided in the machine room.

[0037] The beam shaping system 102 includes an EUV light source 108, a collimator 110, and a monochromator 112. As the EUV light source 108, for example, a plasma source or a synchrotron may be provided, which emits radiation in the EUV range (extreme ultraviolet ra...

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Abstract

A lithography apparatus is disclosed, which comprises a mirror having at least two mirror segments which are joined together in such a way that an interspace is formed between the mirror segments, and a sensor for detecting the relative position of the mirror segments, wherein the sensor is arranged in the interspace between the mirror segments.

Description

[0001] Cross references to related applications [0002] This application claims the priority of German patent application DE 10 2012 212 064.5 (filed on July 11, 2012) and U.S. patent application US 61 / 670,215 (filed on July 11, 2012), the full text of which is hereby incorporated by reference Into this article. Technical field [0003] The invention relates to a lithographic apparatus comprising one or more segmented mirrors. Background technique [0004] The lithographic apparatus is used, for example, to manufacture integrated circuits or ICs, so as to image the mask pattern in the mask on a substrate, such as a silicon wafer. To this end, the light beam generated by the lighting device is guided through the mask to reach the substrate. An exposure lens composed of multiple optical elements is used to focus the light beam on the substrate. An example of such a lithography apparatus is especially an EUV (Extreme Ultraviolet) lithography apparatus, which operates with an exposu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01L21/00G01B7/14G01B13/12G03F7/20
CPCG03F7/70233G01L21/22G03F7/7085G03F7/70591G03F7/702G01B7/14G01B13/12
Inventor J.哈特杰斯
Owner CARL ZEISS SMT GMBH
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