Cerium and tin co-doped fluorphosphate luminescent material, and preparation method and application of fluorphosphate luminescent
A fluorophosphate, luminescent material technology, applied in luminescent materials, chemical instruments and methods, semiconductor devices, etc., to achieve the effects of high thermal and mechanical stability, good optical transparency, and few radiation transitions
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[0030] The preparation method of the above-mentioned cerium-tin co-doped fluorophosphate luminescent material comprises the following steps:
[0031] Step S11, according to Me 5-x-y (PO 4 ) 3 F: xCe 3+ ,ySn 4+ The stoichiometric ratio of each element is measured as MeO, MeF 2 ,P 2 o 5 , CeO 2 and SnO 2 The powder is uniformly mixed to obtain a mixed powder, wherein, x is 0.01-0.05, y is 0.01-0.06, Me is magnesium ion, calcium ion, strontium ion or barium ion;
[0032] In this step, preferably, x is 0.03 and y is 0.04.
[0033] Step S12, sintering the mixed powder at 900°C-1300°C for 0.5-3 hours to obtain the chemical formula Me 2 Si 6 N 10 :xSm 3+ Ce-Sn co-doped fluorophosphate luminescent materials.
[0034] In this step, it is preferable to sinter at 1250° C. for 1.5 hours.
[0035] A cerium-tin co-doped fluorophosphate luminescent film according to one embodiment, the chemical formula of the material of the cerium-tin co-doped fluorophosphate luminescent film...
Embodiment 1
[0067] Choose powder with a purity of 99.99%, and mix MgO, MgF 2 , P 2 o 5 , CeO 2 and SnO 2 The powder is mixed evenly according to the molar ratio of 4.93:1.5:0.03:0.04 to obtain a mixed powder, and the mixed powder is sintered at 1250°C for 1.5h to form a ceramic target with a diameter of 50mm and a thickness of 2mm, and the target is placed in a vacuum chamber in vivo. Then, the glass substrate with ITO was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate is set to 60mm. Use a mechanical pump and a molecular pump to pump the vacuum of the cavity to 5.0×10 -4 Pa, the working gas flow rate of argon is 25sccm, the pressure is adjusted to 2.0Pa, the substrate temperature is 500°C, and finally annealed in a 0.01Pa vacuum furnace for 2h, and the annealing temperature is 600°C. Get the chemical formula Mg 4.93 (PO 4 ) 3 F: ...
Embodiment 2
[0073] Choose powder with a purity of 99.99%, and mix MgO, MgF 2 , P 2 o 5 , CeO 2 and SnO 2 The powder is mixed uniformly according to the molar number of 4.98:1.5:0.01:0.01 to obtain a mixed powder, and the mixed powder is sintered at 900°C for 0.5h to form a ceramic target with a diameter of 50mm and a thickness of 2mm, and the target is placed in a vacuum chamber in vivo. Then, the glass substrate with ITO was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate was set to 45 mm. Use a mechanical pump and a molecular pump to evacuate the vacuum of the chamber to 1.0×10 -3 Pa, the working gas flow rate of argon is 10sccm, the pressure is adjusted to 0.2Pa, the substrate temperature is 250°C, and finally annealed in a 0.01Pa vacuum furnace for 1h, and the annealing temperature is 500°C. Get the chemical formula Mg 4.98 (PO ...
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