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Method for preparing high-purity silica

A technology of high-purity silicon dioxide and hydrated silicon dioxide, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems of unstable product quality, long production process, environmental pollution, etc., and achieve good product quality, stable quality, The effect of short working hours

Inactive Publication Date: 2014-12-24
天津市风船化学试剂科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The above two methods will cause certain environmental problems, pollute the environment, and the production process is long, the operation is cumbersome and complicated, and the product quality is unstable

Method used

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  • Method for preparing high-purity silica

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] A preparation method of high-purity silicon dioxide, the steps are as follows:

[0023] (1) Hydrolysis: Put 1000 ml of tetraethyl orthosilicate in a 5000 ml glass beaker, add 1000 ml of 10% ammonia water, heat under stirring, stop heating after the solution boils, and continue stirring for 30 minutes, stop stirring, and the precipitate Stand overnight, the precipitate is hydrated silica;

[0024] (2) Drying: Dry the sediment that has been left standing overnight with a centrifuge, put the dried hydrated silica into a 3000ml porcelain dish, and bake in a drying oven at about 100°C for 2-3 sky.

[0025] (3) Ignition: put the dried hydrated silica into a high-temperature furnace and heat up at about 900°C for 8 hours, then take it out after natural cooling to obtain high-purity silica.

[0026] In this example, the purity of ethyl orthosilicate is 99.99%, and 10% ammonia water is a self-made high-purity reagent.

Embodiment 2

[0028] A preparation method of high-purity silicon dioxide, the steps are as follows:

[0029] (1) Hydrolysis: Put 1000 ml of tetraethyl orthosilicate in a 5000 ml glass beaker, add 2000 ml of 5% ammonia water, heat under stirring, stop heating after the solution boils, and continue stirring for 40 minutes, stop stirring, and the precipitate Stand overnight, the precipitate is hydrated silica;

[0030] (2) Drying: Dried the sediment left standing overnight with a centrifuge, put the dried hydrated silica into a 3000ml porcelain dish, and baked it in a drying oven at about 102°C for 3 days.

[0031] (3) Burning: put the dried hydrated silica into a high-temperature furnace and heat up at 950°C for 8 hours, then take it out after natural cooling to obtain high-purity silica.

[0032] In the step (1), the purity of ethyl orthosilicate is ≥99.99%, and the purity requirement of ammonia water is the same as that of ethyl orthosilicate.

Embodiment 3

[0034] A preparation method of high-purity silicon dioxide, the steps are as follows:

[0035] (1) Hydrolysis: Put 1000 ml of tetraethyl orthosilicate in a 5000 ml glass beaker, add 1500 ml of 5% ammonia water, heat under stirring, stop heating after the solution boils, and continue stirring for 20 minutes, stop stirring, and the precipitate Stand overnight, the precipitate is hydrated silica;

[0036] (2) Drying: The sediment left standing overnight was dried with a centrifuge, and the dried hydrated silica was put into a 3000 ml porcelain dish, and baked in a drying oven at 90° C. for 2.5 days.

[0037] (3) Burning: put the dried hydrated silica into a high-temperature furnace and heat up at 850°C for 7.5 hours, then take it out after natural cooling to obtain high-purity silica.

[0038] In the step (1), the purity of ethyl orthosilicate is ≥99.99%, and the purity requirement of ammonia water is the same as that of ethyl orthosilicate.

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Abstract

The invention relates to a method for preparing high-purity silica. The method comprises the following steps: by taking high-purity ethyl orthosilicate as a raw material, adding ammonia water, hydrolyzing the ethyl orthosilicate to generate hydrated silica, drying, firing, thereby obtaining the high-purity silica. According to the method disclosed by the invention, the ethyl orthosilicate serving as the raw material is added into the ammonia water to be hydrolyzed, a hydrated silica precipitate is generated, and the high-purity silica is prepared by separating, drying and firing. According to the method, hydrolysis conditions are not needed to be strictly controlled, lots of water is not needed to be used for repeatedly washing the precipitate, the process is simple, the labor time is short, the product quality is high, the product of each batch is stable in quality and high in identity, the emission amount of liquid waste is small, and environment friendliness is promoted. The method is low in comprehensive cost and high in economic benefits. The purity of the silica is 99.99 percent, and the high-purity silica prepared by the method can be used for preparing high-purity silicon monoxide and high-purity silicon.

Description

technical field [0001] The invention belongs to the technical field of production of fine chemical products, in particular to a method for preparing high-purity silicon dioxide. Background technique [0002] In this technical field, tetrachlorosilicon hydrolysis is usually used to prepare high-purity silicon dioxide. During the production process of this method, a large amount of acid-containing waste gas will be generated, and a large amount of water will be used for washing. Another method is to use sodium silicate to hydrolyze with acid and then fully wash with water to remove the corresponding sodium salt to obtain high-purity silica. Above-mentioned two kinds of methods all can produce certain environmental problems, pollute the environment, and production technology is longer, operation is loaded down with trivial details, complicated, and product quality is unstable. [0003] After searching, the following patent publications related to the patent application of the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/12
Inventor 郝承志董素娟
Owner 天津市风船化学试剂科技有限公司
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