Preparation technology for mask plate

Abstract

A disclosed preparation technology for a mask plate comprises: firstly electroforming an electroformed layer through an electroforming technology, and then etching an etched groove with certain depth at the opening side of the electroformed layer through an etching technology, wherein the electroforming technology comprises first film pasting, first exposuring, first developing, electroforming and first film removing, and the etching technology comprises secondary film pasting, secondary exposuring, secondary developing, etching, and secondary film removing. The mask plate prepared by employing the provided technology has the opening formed by combining of an electroforming opening and the etched groove, the electroforming opening has smooth sidewall and is easy for demolding, the effective deposition opening precision is easily controlled, and the opening precision is improved; and the etched groove prepared by using the etching technology on the basis of an electroformed opening forms a bowl-shaped hole wall and is combined with the electroformed opening, due to the fact that the bowl-shaped hole wall has a large conicity, shielding of the hole wall to an evaporation material during evaporation is avoided, and the evaporation film-forming rate is improved.

Description

technical field [0001] The invention relates to a manufacturing process of a mask plate for evaporation, in particular to a manufacturing process of a mask plate for OLED evaporation. Background technique [0002] Organic Light-Emitting Diode (OLED), the main structure is composed of an anode (first electrode), a cathode (second electrode) and an organic light-emitting layer between the anode and the cathode, a multilayer with better luminous efficiency The PM-OLED structure also needs to make a hole injection layer (Hole Inject Layer; HIL) and a hole transport layer (Hole Transport Layer; HTL) between the anode and the organic layer, and make an electron transport layer between the organic layer and the cathode ( Electron Transport Layer (ETL), electron injection layer (Electron Inject Layer; EIL) and other structures. The light-emitting mechanism of OLED is to inject electrons and holes from the cathode and anode respectively. The injected electrons and holes are transpor...

AI Technical Summary

Problems solved by technology

Among them, double-sided etching is used to etch from both sides of the tile sheet respectively, and the formed section is a gourd-shaped opening. However, since the etching is a subtractive process and there is side corrosion, the size accuracy of the effective deposition opening on the surface of the sheet is not easy to control. There is a deviation in size, as shown in the figure, the effective deposition opening size L1 of the actual etching is larger than the predetermined size L2, and the opening wall formed by etching is rough and not smooth

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