Ball grid array (BGA) substrate multilayer interconnection structure based on selective aluminum anodizing, and BGA substrate multilayer interconnection method based on selective aluminum anodizing
A multi-layer interconnection and anodized aluminum technology, which is applied in semiconductor/solid-state device components, semiconductor devices, electrical components, etc., can solve problems such as poor heat dissipation characteristics, large shrinkage rate, and limited use
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[0054] The technical solutions in the embodiments of the present invention will be clearly and completely described and discussed below in conjunction with the accompanying drawings of the present invention. Obviously, what is described here is only a part of the examples of the present invention, not all examples. Based on the present invention All other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0055] In order to facilitate the understanding of the embodiments of the present invention, specific embodiments will be taken as examples for further explanation below in conjunction with the accompanying drawings, and each embodiment does not constitute a limitation to the embodiments of the present invention.
[0056] Such as figure 1 As shown, a BGA substrate multilayer interconnection structure 10 based on selective aluminum anodic oxidation provided by the present invention ...
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