A kind of preparation method of millimeter wave rf MEMS switch
A millimeter wave and switching technology, which is applied in the field of MEMS device manufacturing, can solve the problems of low switch yield, difficulty in achieving low insertion loss and high isolation, and short service life, and achieves the effect of a simple method.
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[0037] Below, combine figure 1 The present invention is further described.
[0038] A preparation method of a millimeter-wave RF MEMS switch, the millimeter-wave RF MEMS switch includes a switch substrate, a CPW pattern on the switch substrate and a thin film microbridge 6, the CPW pattern includes an RF transmission line 2 and is located on both sides of the RF transmission line The ground wire 7 specifically includes the following steps:
[0039] (1) On the surface of the high-resistance silicon wafer 1, a layer of polysilicon 4 is grown by PECVD process, and then a layer of silicon dioxide 3 is grown on the polysilicon to obtain a switch substrate;
[0040] (2) cleaning and drying the silicon wafer after step (1);
[0041] (3) Send the silicon chip after step (2) into the magnetron sputtering station, and sputter the titanium-tungsten-gold film layer;
[0042] (4) take out the silicon chip after step (3) processing, cover the position other than the line pattern that nee...
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