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Method for in-situ construction of electrode through electro-depositing super-stable metal thin films on ITO conductive glass surface

A technology of conductive glass and metal thin film, which is applied in the field of electrochemistry, can solve the problems of poor stability of metal thin films, and achieve the effects of ultra-high electrode stability, in-situ construction, and simple preparation

Inactive Publication Date: 2014-11-05
CHANGCHUN INST OF APPLIED CHEMISTRY - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem of extremely poor stability of metal thin films deposited on the surface of ITO, avoid the large-scale vacuum coating equipment needed to build complex electrode systems, reduce the cost and time-consuming of complex electrochemical device construction, and provide an ITO conductive Electrodeposition of ultra-stable metal thin films on glass surfaces to construct electrodes in situ

Method used

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  • Method for in-situ construction of electrode through electro-depositing super-stable metal thin films on ITO conductive glass surface
  • Method for in-situ construction of electrode through electro-depositing super-stable metal thin films on ITO conductive glass surface
  • Method for in-situ construction of electrode through electro-depositing super-stable metal thin films on ITO conductive glass surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Step 1: Cut the ITO conductive glass into a suitable size, ultrasonically clean it with acetone, ethanol and secondary water, blow it dry with nitrogen, and set it aside;

[0046] Step 2: The ITO conductive glass obtained in step 1 is processed by standard lithography technology figure 1 The electrode pattern in is patterned;

[0047]Step 3: The patterned ITO conductive glass obtained in step 2 is used as a working electrode, silver-silver chloride is used as a reference electrode, and platinum is used as a counter electrode, and they are jointly inserted into an electrochemical detection cell containing a phosphate buffer solution of pH=7.40, And connect each electrode to the electrochemical workstation; select the current time curve method in the technical option of the electrochemical workstation, set the potential range to -1.15V, run the electrochemical workstation to scan, and restore it at the potential of -1.15V for 200s to destroy On the surface of ITO conduct...

application example 1

[0051] Put a magnetic stirrer in the electrochemical detection cell, place it on the magnetic stirrer, and use the gold electrode obtained in step 5 as the working electrode, silver-silver chloride as the reference electrode, and platinum as the counter electrode to be inserted in sequence containing 0 μg L -1 , 1 μg L -1 , 3 μg L -1 , 5 μg L -1 , 7 μg L -1 , 10 μg L -1 , 30 μg L -1 , 50 μg L -1 , 70 μg L -1 , 100 μg L -1 , 150 μg L -1 In the electrochemical detection cell of 5mL0.1M hydrochloric acid buffer solution of the mercury ion standard sample, connect each electrode to the used electrochemical workstation, select differential pulse voltammetry in the technical options of the electrochemical workstation, and scan the potential range setting From -0.2V to 0.8V, run the electrochemical workstation to scan, deposit at -0.8V potential, deposit under stirring conditions for 120s, and let it stand for 10s. The enriched mercury will undergo oxidation reaction on the ...

Embodiment 2

[0055] Step 1: Cut the ITO conductive glass into a suitable size, ultrasonically clean it with acetone, ethanol and secondary water, blow it dry with nitrogen, and set it aside;

[0056] Step 2: The ITO conductive glass obtained in step 1 is prepared according to the following steps by using standard lithography technology figure 1 The electrode patterns shown were patterned;

[0057] Step 3: The patterned ITO conductive glass obtained in step 2 is used as a working electrode, silver-silver chloride is used as a reference electrode, and platinum is used as a counter electrode, and they are jointly inserted into an electrochemical detection cell containing a phosphate buffer solution of pH=6.80, And connect each electrode to the electrochemical workstation; select the current time curve method in the technical option of the electrochemical workstation, set the potential range to -1.15V, run the electrochemical workstation to scan, and restore it at the potential of -1.15V for 2...

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Abstract

The invention relates to a method for in-situ construction of an electrode through electro-depositing super-stable metal thin films on an ITO conductive glass surface, and relates to the electrochemical field. The method solves the problem of extremely poor stability of ITO surface deposited metal thin films, and at the same time, omits a large vacuum coating device required for constructing a complex electrode system, so as to greatly reduce the cost and time consumption for constructing a complex electrochemical device. According to the method, a three-electrode system is composed of the ITO as a working electrode, Ag-AgCl as a reference electrode and platinum as a counter electrode, and after the working electrode surface is subjected to reduction, stripping and roughening, the voltage is applied through a step pulse method or a current-time curve method for electro-depositing various super-stable metal thin films. The electrode preparation method is universal, simple and fast, also has double natures of macroscopic smoothness and microcosmic roughness, and greatly improves the stability and electrochemical active area of the electrode.

Description

technical field [0001] The invention relates to the field of electrochemistry, in particular to a method for in-situ construction of an electrode by electrodepositing an ultra-stable metal film on the surface of an ITO conductive glass. Background technique [0002] As one of the important methods in the fields of analysis and catalysis, electrochemical methods have attracted widespread attention because of their high sensitivity, fast response, simple equipment and easy miniaturization. Among them, the miniaturization of the electrode is a key problem, involving many issues such as its stability, reproducibility, and electrochemical activity. More importantly, integrating electrodes of different materials requires large-scale vacuum coating equipment, which is time-consuming and expensive. Therefore, the development of a fast, stable and general-purpose preparation method for flat-plate electrodes is of great significance to the further development and practical applicatio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/30G01N27/333G01N27/36
Inventor 张晓伟李敬娄保华李冬月汪尔康
Owner CHANGCHUN INST OF APPLIED CHEMISTRY - CHINESE ACAD OF SCI
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