A kind of preparation method of flexible ultra-thin glass
An ultra-thin glass and flexible technology, applied in glass manufacturing equipment, glass molding, glass production, etc., can solve problems that affect product processing performance, micro-waviness warping, point defects, etc., and achieve strong application potential, The effect of strong flexibility and simple preparation method
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Embodiment 1
[0036] according to figure 1 The process flow of the chemical vapor deposition technology shown in the preparation of ultra-thin glass, the specific steps are as follows:
[0037] 1. Put the tin nugget into the molding slot.
[0038] 2. Put the molding tank into the reaction chamber of the chemical vapor deposition system, and adjust the temperature of the chamber to 300°C;
[0039] 3. Turn on the mechanical pump in turn to pump the low vacuum of the reaction chamber to about 1Pa;
[0040] 4. Introduce argon gas, the flow rate is 45sccm, adjust the chamber pressure to 30Pa; turn on the radio frequency power supply, set the radio frequency power to 200W;
[0041] 5. Introduce ammonia gas with a flow rate of 40 sccm; after the pressure stabilizes, inject silane with a total flow rate of 20 sccm; finally readjust the reaction pressure to 30 Pa;
[0042] 6. Control the growth time for 60 minutes to prepare silicon nitride film;
[0043] 7. Stop feeding ammonia gas.
[0044] 8...
Embodiment 2
[0051] according to figure 1 The process flow of the chemical vapor deposition technology shown in the preparation of ultra-thin glass, the specific steps are as follows:
[0052] 1. Put the tin nugget into the molding slot.
[0053] 2. Put the molding tank into the reaction chamber of the chemical vapor deposition system, and adjust the temperature of the chamber to 500°C;
[0054] 3. Turn on the mechanical pump in turn to pump the low vacuum of the reaction chamber to about 1Pa;
[0055] 4. Introduce argon gas, the flow rate is 45sccm, adjust the chamber pressure to 200Pa; turn on the radio frequency power supply, set the radio frequency power to 200W;
[0056] 5. Introduce ammonia gas with a flow rate of 40 sccm; after the pressure stabilizes, inject silane with a total flow rate of 20 sccm; finally readjust the reaction pressure to 200 Pa;
[0057] 6. Control the growth time for 120 minutes to prepare silicon nitride film;
[0058] 7. Stop feeding ammonia gas.
[0059...
Embodiment 3
[0066] according to figure 2 The shown cullet fusing method process is used to prepare ultra-thin glass, and the specific steps are as follows:
[0067] 1. Put the tin block into the molding tank and heat the molding tank to 950°C.
[0068] 2. Sprinkle the broken glass powder with a particle size of 10μm evenly on the surface of the molten tin and melt it immediately.
[0069] 3. Cool the temperature of the molding tank and control it at 280°C.
[0070] 4. Remove the glass after the molten glass on the surface solidifies.
[0071] 5. Use a polishing machine for polishing.
[0072] The SEM image of the flexible ultra-thin glass obtained through the above process and the graph of the variation of transmittance with wavelength are similar to those in Example 1.
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