Preparation method of surface coating for colored thin film solar cell
A technology of thin-film solar cells and solar cells, applied in coatings, metal material coating processes, circuits, etc.
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Embodiment 1
[0021] This embodiment follows the steps:
[0022] Sequentially use acetone, absolute ethanol and deionized water to ultrasonically clean the flat glass substrate for 10min~15min, rinse with absolute ethanol, and blow dry with N2;
[0023] JCP-450 three-target magnetron sputtering coating system is adopted, with a doping concentration of 2%~13%ZnO:B ceramic target as the raw material, and the sputtering gas is Ar gas with a purity of 99.99%;
[0024] The substrate temperature is room temperature~300℃, the background vacuum is 4.0×10-5pa~6.0×10-5pa, the flow rate of Ar gas is 10sccm~22 sccm, the sputtering pressure is adjusted to 0.5pa~1.5pa, and the power is 80w ~140w (0.4~1.2A,
[0025] 66~300V), the sputtering time is 5min~30min, and the ZnO:B thin film is prepared on the substrate by sputtering;
[0026] Put the ZnO:B film sample into the RTP-500 photothermal rapid annealing furnace, and perform rapid annealing at a temperature of 200°C~500°C for 5min~60min under N2 atm...
Embodiment 2
[0029] This embodiment follows the steps:
[0030] Sequentially use acetone, absolute ethanol and deionized water to ultrasonically clean the flat glass substrate for 10-15 minutes, rinse with absolute ethanol, and blow dry with N2;
[0031] The JCP-450 three-target magnetron sputtering coating system is adopted, the ZnO:B ceramic target with a doping concentration of 5%~25% is used as the raw material, and the sputtering gas is Ar gas with a purity of 99.99%;
[0032] The substrate temperature is from room temperature to 300°C, the background vacuum is 4.0×10-5pa~6.0×10-5pa, Ar gas with a purity of 99.999% is introduced, the gas flow is 10sccm~30sccm, and the sputtering pressure is adjusted to 0.5pa~ 1.5pa, the power is 80w~140w (0.4~1.2A, 66~300V), the sputtering time is 10min~30min, and the ZnO:B thin film is prepared on the substrate by sputtering;
[0033] Put the ZnO:B film into the RTP-500 photothermal rapid annealing furnace, and perform rapid annealing at a tempera...
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