Treatment method of copper-containing etching liquid
A treatment method, copper etching technology, applied in chemical instruments and methods, multi-stage water/sewage treatment, water/sludge/sewage treatment, etc., can solve problems such as unsatisfactory treatment effect, cumbersome process, and secondary pollutants , to avoid waste of resources, low impurity content, and save raw material costs
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0026] A processing method for copper-containing etching solution, the operation method is as follows:
[0027] 1. Add sodium hydroxide dropwise to the etching solution with a copper content of 130 g / L, and adjust the pH value to 2.0;
[0028] 2. Add 60g / L of aluminum (model: 1080) for the first reaction at a temperature of 75°C. During the reaction, use a Roots blower to blow air from the bottom, and react until the copper content in the solution is 8g / L;
[0029] 3. Let stand for 25 minutes and filter;
[0030] 4. Add 5g / L H to the filtrate 2 o 2 and aluminum 8g / L, the temperature is 60°C, during the reaction process, the copper content in the solution is 0.02g / L by feeding air from the bottom;
[0031] 5. After standing for 25 minutes, filter, the precipitate is electronic grade copper powder, and the filtrate is polyaluminum chloride flocculant;
[0032] 6. Wash the copper powder with deionized water and distilled water for 3 times, each time for 0.5h, and centrifuge ...
Embodiment 2
[0036] A processing method for copper-containing etching solution, the operation method is as follows:
[0037] 1. Add a certain amount of copper powder rinsing water to the etching solution with a copper content of 150 g / L, and then add sodium hydroxide dropwise to adjust the pH value to 3.0;
[0038] 2. Add 80g / L of aluminum (model: 1080A) for the first reaction at a temperature of 85°C. During the reaction, a Roots blower is used to feed air from the bottom until the copper content in the solution is 7g / L;
[0039] 3. Let stand for 35 minutes and filter
[0040] 4. Add 6g / L H to the filtrate 2 o 2 and an appropriate amount of aluminum 7g / L, the temperature is 65°C, during the reaction process, air is passed through the bottom, and the copper content in the solution is reacted to 0.03g / L;
[0041] 5. After standing for 28 minutes, filter, the precipitate is electronic grade copper powder, and the filtrate is polyaluminum chloride flocculant;
[0042] 6. Wash the copper ...
Embodiment 3
[0046] A processing method for copper-containing etching solution, the operation method is as follows:
[0047] 1. Add a certain amount of copper powder rinsing water to the etching solution with a copper content of 145 g / L, and then add sodium hydroxide dropwise to adjust the pH value to 2.2;
[0048] 2. Add 65g / L of aluminum (model: 107000A) for the first reaction at a temperature of 80°C. During the reaction, a Roots blower is used to feed air from the bottom until the copper content in the solution is 6g / L;
[0049] 3. Let stand for 30 minutes and filter;
[0050] 4. Add 5.3g / L H to the filtrate 2 o 2 and an appropriate amount of aluminum 6g / L, the temperature is 70°C, and the copper content in the solution is 0.03g / L by passing air from the bottom during the reaction;
[0051] 5. After standing for 32 minutes, filter, the precipitate is electronic grade copper powder, and the filtrate is polyaluminum chloride flocculant;
[0052] 6. Wash the copper powder with deionize...
PUM
Property | Measurement | Unit |
---|---|---|
density | aaaaa | aaaaa |
density | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com