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The Method of Increasing the Thickness of Electroless Nickel-Phosphorus Alloy Layer by Electric Pulse

An electroless nickel-phosphorus and electroless nickel-plating technology, applied in liquid chemical plating, metal material coating process, coating and other directions, can solve the problem of no more than 100 microns, and achieve the effect of improving autocatalytic activity

Active Publication Date: 2016-01-20
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention solves the problem that the thickness of the coating generally does not exceed 100 microns in the existing electroless nickel plating process, and provides a method for increasing the thickness of the electroless nickel-phosphorus alloy layer by providing electric pulses

Method used

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  • The Method of Increasing the Thickness of Electroless Nickel-Phosphorus Alloy Layer by Electric Pulse
  • The Method of Increasing the Thickness of Electroless Nickel-Phosphorus Alloy Layer by Electric Pulse

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specific Embodiment approach 1

[0014] Specific embodiment one: the electric pulse described in the present embodiment improves the method for electroless nickel-phosphorus alloy layer thickness, specifically carries out according to the following steps:

[0015] 1. Pretreatment: Pretreat the parts to be plated to obtain the pretreated parts to be plated;

[0016] 2. Electric pulse and nickel plating treatment: ①. Take the pretreated part as the cathode and pure nickel as the anode. Apply a pulse power supply to the side; ②, the current in the pulse power supply is 1A / m 2 ~10A / m 2 Pulse down for 1s~5s, then pause the pulse for 10min~30min; ③, take step 2② as a cycle process, take the pulse time and pause pulse time as the total nickel plating time, step 2② cycle until the total nickel plating time is 10h~ After 20 hours, the plated parts with increased electroless nickel-phosphorus alloy layer thickness can be obtained.

[0017] The beneficial effect of this embodiment is: this embodiment applies a cathod...

specific Embodiment approach 2

[0018] Embodiment 2: This embodiment differs from Embodiment 1 in that the part to be plated in step 1 is an aluminum base part or an iron base part. Others are the same as in the first embodiment.

specific Embodiment approach 3

[0019] Embodiment 3: The difference between this embodiment and Embodiment 1 or 2 is that the pretreatment described in step 1 is carried out according to the following steps: when the part to be plated is an aluminum matrix part, the pretreatment process is as follows : ①. At a temperature of 55°C-65°C, use a chemical degreasing solution to chemically degrease the aluminum base parts for 1min-2min, then wash with hot water at a temperature of 50°C-60°C for 15s, and then wash with water at room temperature for 10s- 15s; the chemical degreasing liquid is mixed with sodium carbonate, sodium phosphate, sodium silicate and solvent water; the concentration of sodium carbonate in the chemical degreasing liquid is 35g / L~45g / L; the The concentration of sodium phosphate in the chemical degreasing liquid is 45g / L-55g / L; the concentration of sodium silicate in the chemical degreasing liquid is 20g / L-30g / L; 60s and washed with water for 10s to 15s; the primary zinc dipping solution is mix...

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Abstract

The invention relates to a method for increasing the thickness of the electroless nickel-phosphorus alloy layer by electric pulse, and the invention relates to a method for increasing the thickness of the electroless nickel-phosphorus alloy layer. The invention aims to solve the problem that the coating thickness generally does not exceed 100 microns in the existing electroless nickel plating process. Methods: 1. pretreatment; 2. electric pulse and nickel plating treatment, that is, to obtain the plated parts with increased thickness of electroless nickel-phosphorus alloy layer. The invention enables the thickness of the electroless nickel-phosphorus alloy plating layer to reach more than 200 micrometers, and is suitable for occasions where the thickness of the electroless nickel-phosphorus alloy plating layer exceeds 200 micrometers. The invention is used in the method for increasing the thickness of the electroless nickel-phosphorus alloy layer by electric pulse.

Description

technical field [0001] The invention relates to a method for increasing the thickness of an electroless nickel-phosphorus alloy layer. Background technique [0002] Electroless nickel-phosphorus alloy is widely used in petroleum, chemical industry, automobile, electronics, computer, aerospace, aviation, precision machinery and other industrial fields due to its uniform coating, good corrosion resistance, wear resistance and high hardness. In the existing electroless nickel plating process, since the self-catalytic activity of the surface is weakened with the increase of the thickness of the coating, the thickness of the coating is generally not more than 100 microns, which is difficult to meet the special occasions where the thickness of the coating exceeds 200 microns. Contents of the invention [0003] The invention solves the problem that the coating thickness generally does not exceed 100 microns in the existing electroless nickel plating process, and provides a method...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C18/32C23C18/36C23C18/18
CPCC23C18/1671C23C18/1844C23C18/36C23C18/54C25D3/562C25D5/18
Inventor 王殿龙王骐徐强赵永鹏
Owner HARBIN INST OF TECH
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