Method for preparing filler-level silicon micropowder by using waste quartz crucibles as raw materials
A waste quartz crucible, quartz crucible technology, applied in the direction of silicon oxide, silicon dioxide, etc., can solve the problem that it is difficult to meet the needs of high-quality silicon natural resources, and achieve the effects of improving grinding efficiency, reducing costs, and simplifying process steps
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Embodiment example 1
[0044] (1) Ultrasonic water washing: place large pieces of quartz crucible in the cleaning tank, add water for ultrasonic cleaning, ultrasonic time 1 h, power: 500 kHz;
[0045](2), crushing and screening: use a roller crusher to crush the cleaned quartz crucible fragments to particle size ≤ 3 mm;
[0046] (3) Grinding and pickling: put the particle size ≤ 3 mm in the ball mill, add sulfuric acid and hydrochloric acid mixed acid, adjust the slurry concentration to 45%, and the ball milling time is 4.5 h; centrifuge after ball milling, and the upper acid solution Recycling and reuse, the bottom slurry is centrifugally cleaned with high-purity water until the upper layer solution is neutral; after vibrating sieving, the under-sieve slurry of 325 mesh (45 μm) is obtained, and the coarse powder is returned to the mill for grinding;
[0047] (4) Wet magnetic separation: use high-purity water to adjust the flotation slurry into a slurry with a slurry concentration of 30%, and the sl...
Embodiment example 2
[0054] (1) Ultrasonic water washing: put the large pieces of quartz crucible in the cleaning tank, add water for ultrasonic cleaning, ultrasonic time 1.5 h, power: 450 kHz;
[0055] (2), crushing and screening: use a roller crusher to crush the cleaned quartz crucible fragments to particle size ≤ 3 mm;
[0056] (3) Grinding and pickling: put the granular material with a particle size of ≤3 mm in a ball mill, add nitric acid, sulfuric acid and hydrochloric acid mixed acid, adjust the slurry concentration to 55%, and mill for 4 hours; after ball milling, centrifuge the upper layer The acid solution is recovered and reused, and the bottom slurry is centrifugally washed with high-purity water until the upper layer solution is neutral; after vibrating sieving, the under-sieve slurry of 325 mesh (45 μm) is obtained;
[0057] (4) Wet magnetic separation: use high-purity water to adjust the flotation slurry into a slurry with a slurry concentration of 25%, and the slurry flows into th...
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