Anti-collision suspended polishing device

Abstract

An anti-collision suspended polishing device comprises a machine base, a suspended basic disc, a grinding disc and a correction ring. The suspended basic disc is connected with a pressurizing assembly, the suspended basic disc is clamped in the corrosion ring which is installed on the grinding disc, the grinding disc rotates around a fixed center axis through a main driver, wedge-shaped grooves and positioning work positions for placing workpiece to be processed are formed in corresponding surfaces of the suspended basic disc and the grinding disc along the circumferential direction, polishing liquid is full of the wedge-shaped grooves, and the wedge-shaped grooves and the processing work positions are arranged at intervals. The polishing device further comprises a first permanent magnet ring and a second permanent magnet ring, the first permanent magnet ring is sleeved on the outer side of the suspended basic disc, the second permanent magnet ring is sleeved on the inner surface of the connection ring, a gap is reserved between the first permanent magnet ring and the second permanent ring, and the magnetism of an outer ring of the first permanent magnet ring is the same as that of an inner ring of the second permanent magnet ring. The anti-collision polishing device is stable to grind, small in surface damage and high in quality.

Description

technical field [0001] The invention relates to the field of polishing, in particular to a suspension polishing device. Background technique [0002] The substrate is an indispensable material in the preparation process of the amorphous film, and the properties of the substrate will seriously affect the surface morphology of the amorphous film. In order to obtain a thin, defect-free and good adhesion alloy film, the substrate is required to have less Damaged ultra-smooth surface. Avoid the impact of mechanical damage, pollution, oxidation, excessive corrosion and other factors on the surface, so the traditional chemical mechanical polishing technology is not completely suitable for ultra-precision polishing of amorphous thin film substrates. [0003] Fluid polishing has now become one of the important means to obtain ultra-smooth surfaces. Compared with rigid contact polishing, the contact state between abrasive grains and workpiece surface is soft contact, which can be obt...

AI Technical Summary

Problems solved by technology

[0005] In order to overcome the disadvantages of unstable grinding and low surface quality in the prior art, the present invention provides an anti-collision suspension polishing device with stable grinding, small surface damage and high quality

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