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Array substrate, display device and manufacturing method of array substrate

An array substrate and manufacturing method technology, applied in the display field, can solve the problems of low panel aperture ratio and transmittance, achieve the effects of increasing aperture ratio and transmittance, reducing storage capacitance, and reducing charging time

Active Publication Date: 2013-09-04
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The disadvantage of the existing technology is that due to the existence of the common electrode lines on the array substrate, the black matrix on the color filter substrate will cover the common electrode lines, resulting in low aperture ratio and transmittance of the panel.

Method used

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  • Array substrate, display device and manufacturing method of array substrate
  • Array substrate, display device and manufacturing method of array substrate
  • Array substrate, display device and manufacturing method of array substrate

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Embodiment Construction

[0044] In order to increase the panel aperture ratio, the present invention provides an array substrate, a display device and a manufacturing method of the array substrate. In this technical solution, since the common electrode lines are located below the scanning lines, the line width of the black matrix on the color filter substrate can be reduced correspondingly, thereby improving the panel aperture ratio and transmittance, and between the scanning lines and the common electrode lines. The electrode lines are separated by an insulating layer, which effectively reduces the storage capacitance, thereby shortening the charging time of the pixel. In order to make the purpose, technical solution and advantages of the present invention clearer, the following specific examples are given to further describe the present invention in detail.

[0045] Such as Figure 4 As shown, a schematic structural diagram of an embodiment of the array substrate of the present invention, Figure ...

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Abstract

The invention relates to the display technical field, and discloses an array substrate, a display device and a manufacturing method of the array substrate. The array substrate comprises an underlayer substrate and a plurality of thin film transistors arranged in an array and further comprises public electrode wires, public electrodes and an insulating layer, wherein the public electrode wires are positioned on the underlayer substrate, the public electrodes are positioned on the underlayer substrate and connected with the public electrode wires, and the insulating layer covers the public electrode wires, the public electrodes and the underlayer substrate. The thin film transistors are positioned on the insulating layer, and scanning lines connected with grids of the thin film transistors in each row are positioned above the public electrode wires. By adoption of the technical scheme, due to the fact that the public electrode wires are positioned below the scanning lines, and the insulating layer is adopted for carrying out insulating between the scanning lines and the public electrode wires, the line width of a black matrix of a color film substrate can be reduced correspondingly, and then an aperture opening ratio and transmittance of a panel are improved.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a display device and a manufacturing method of the array substrate. Background technique [0002] Among flat panel display devices, Thin Film Transistor Liquid Crystal Display (TFT-LCD) has the characteristics of small size, low power consumption, relatively low manufacturing cost and no radiation, and occupies a dominant position in the current flat panel display market. [0003] At present, the display modes of TFT-LCD mainly include TN (TwistedNematic, twisted nematic) mode, VA (VerticalAlignment, vertical orientation) mode, IPS (In-Plane-Switching, plane direction conversion) mode and AD-SDS (ADvancedSuperDimensionSwitch, advanced Ultra-dimensional field conversion technology, referred to as ADS) mode, etc. [0004] Among them, the display based on the ADS mode forms a multi-dimensional electric field through the electric field generated by the e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1362G02F1/1368H01L21/336
CPCG02F1/133512G02F1/133707G02F1/136286G02F2201/40G02F1/13629H01L27/124
Inventor 吴洪江
Owner BOE TECH GRP CO LTD
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