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Chirality graphite phase carbon nitride polymer semiconductor photocatalyst

A graphite phase carbon nitride and photocatalyst technology, applied in the direction of organic compound/hydride/coordination complex catalyst, physical/chemical process catalyst, chemical/physical process, etc., to achieve good activity stability and good controllability and broad-spectrum, the effect of improving the performance of photocatalytic hydrogen production

Active Publication Date: 2013-08-14
FUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the research work on introducing chiral and helical micro-nano structures into carbon nitride has not been reported yet.

Method used

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  • Chirality graphite phase carbon nitride polymer semiconductor photocatalyst
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Examples

Experimental program
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Effect test

Embodiment 1

[0026] Mix L-alanine, sodium hydroxide solution, and 30% acetone solution, add tetradecyl chloride and NaOH solution dropwise at 0°C, and maintain the pH at 12. After the reaction, add HCl solution to adjust the pH to 1. Stir, wash, and dry to obtain C 14 -L-AlaA. Take 0.3g C 14 - Add 10g water and 10g NaOH (0.1mol / L) solution to L-AlaA, stir at room temperature to dissolve, then add 10g HCl (0.01mol / L) solution, stir at 22°C for 1h, add 0.23g 3-aminopropyltriethyl The mixture of oxysilane and 1.46g ethyl orthosilicate was stirred for 0.5h, allowed to stand for 1 day, centrifuged, washed with water, and dried. Chiral mesoporous silica was calcined at 550°C for 6h, ground, added 1 mol / L HCl, stirred at 80°C, centrifuged, dried, and ground. In a round bottom flask, add cyanamide and treated chiral mesoporous silica (mass ratio: 6:1), vacuumize, heat and sonicate, and stir at 60°C. Wash with water, take the precipitate, dry and grind. The solid powder in N 2 Calcined at 550...

Embodiment 2

[0028] Mix L-alanine, sodium hydroxide solution, and 30% acetone solution, add tetradecyl chloride and NaOH solution dropwise at 0°C, and maintain the pH at 12. After the reaction, add HCl solution to adjust the pH to 1. Stir, wash, and dry to obtain C 14 -L-AlaA. Take 0.3g C 14 - Add 10g water and 10g NaOH (0.1mol / L) solution to L-AlaA, stir at room temperature to dissolve, then add 10g HCl (0.01mol / L) solution, stir at 22°C for 1h, add 0.23g 3-aminopropyltriethyl The mixture of oxysilane and 1.46g ethyl orthosilicate was stirred for 0.5h, allowed to stand for 1 day, centrifuged, washed with water, and dried. Chiral mesoporous silica was calcined at 550°C for 6h, ground, added 1 mol / L HCl, stirred at 80°C, centrifuged, dried, and ground. In a round-bottomed flask, add cyanamide and treated chiral mesoporous silica (mass ratio: 7:1), vacuumize, heat and sonicate, and stir at 60°C. Wash with water, take the precipitate, dry and grind. The solid powder in N 2 Calcined at 5...

Embodiment 3

[0030]Mix L-alanine, sodium hydroxide solution, and 30% acetone solution, add tetradecyl chloride and NaOH solution dropwise at 0°C, and maintain the pH at 12. After the reaction, add HCl solution to adjust the pH to 1. Stir, wash, and dry to obtain C 14 -L-AlaA. Take 0.3g C 14 - Add 10g water and 10g NaOH (0.1mol / L) solution to L-AlaA, stir at room temperature to dissolve, then add 10g HCl (0.01mol / L) solution, stir at 22°C for 1h, add 0.23g 3-aminopropyltriethyl The mixture of oxysilane and 1.46g ethyl orthosilicate was stirred for 0.5h, allowed to stand for 1 day, centrifuged, washed with water, and dried. Chiral mesoporous silica was calcined at 550°C for 6h, ground, added 1 mol / L HCl, stirred at 80°C, centrifuged, dried, and ground. In a round bottom flask, add cyanamide and treated chiral mesoporous silica (mass ratio: 8:1), vacuumize, heat and sonicate, and stir at 60°C. Wash with water, take the precipitate, dry and grind. The solid powder in N 2 Calcined at 550°...

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Abstract

The invention discloses a chirality graphite phase carbon nitride polymer semiconductor photocatalyst as well as a preparation method and applications thereof, and belongs to the technical field of material preparation and photocatalysis. Chirality graphite phase carbon nitride is synthesized by taking cyanamide as a precursor and chirality mesoporous silica as a hard template, and removing the template through heat polymerization. The chirality graphite phase carbon nitride prepared by the invention has a chirality spiral-bar-shaped morphology and a micro-nano structure, shows particular circular dichroism and optical activity by when being compared with traditional body phase carbon nitride, has a great specific surface area and a high optical absorption performance, and shows a favorable optical catalysis hydrogen generating performance under visible light. According to the invention, the chirality graphite phase carbon nitride polymer semiconductor photocatalyst is synthesized; a preparation technology is improved; and the chirality graphite phase carbon nitride polymer semiconductor photocatalyst as well as the preparation method and applications thereof have an important application prospect.

Description

technical field [0001] The invention belongs to the technical field of material preparation and photocatalysis, and specifically relates to a chiral graphite phase carbon nitride polymer semiconductor photocatalyst, a preparation method and application thereof. Background technique [0002] If a substance does not coincide with its mirror image, we say it has chirality, and this substance is called a chiral substance. Chiral substances widely exist in natural and synthetic materials and drugs. Because of their important roles in materials, catalysis, sensing, molecular recognition, etc., the artificial synthesis of chiral materials is of great significance. At present, people have prepared chiral silica, metal oxides, gold clusters, molecular sieves, metal-organic framework materials, organics, polymers and so on. A typical example is chiral mesoporous silica material. Recently, Che Shunai and others successfully synthesized mesoporous silica materials with chiral helical...

Claims

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Application Information

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IPC IPC(8): B01J31/06C01B3/04
CPCY02E60/364Y02E60/36
Inventor 王心晨郑云张贵刚任禾
Owner FUZHOU UNIV
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