Array substrate, array substrate preparation method and display device

Abstract

An array substrate, a manufacturing method thereof and a display device are provided, and the array substrate comprises: a substrate (1); a plurality of data lines (16), formed on the substrate and extending in a first direction; a plurality of gate lines (15), formed on the substrate (1), crossing the plurality of data lines (15), and extending in a second direction perpendicular to the first direction; a plurality of pixel regions, defined by the plurality of gate lines (15) and the plurality of data lines (15) crossing each other and arranged in a matrix form, wherein each of the pixel regions is provided with a thin film transistor and a pixel electrode (12), wherein, the thin film transistor comprises: a gate electrode (2), connected with one of the plurality of gate lines (15); a gate insulating layer (3), provided above the gate line (15) and the gate electrode (2); an active layer (5), formed on the gate insulating layer (3) and disposed corresponding to the gate electrode (2); a drain electrode (8) and a source electrode (9), disposed opposite to each other above the active layer (5) and having a channel region of the thin film transistor therebetween; a filling layer (4), provided between the gate electrode (2) and the gate line (15) connected with the gate electrode, and the drain and source electrodes (8) and (9); and a passivation layer (10), provided on the source electrode (9), the drain electrode (8) and the active layer (5), wherein at a position directly facing the gate line (15), the passivation layer (10) is provided with a passivation layer through hole (11) configured to perform a connection between the drain electrode (8) and the pixel electrode (12).

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to an array substrate, a method for preparing the array substrate and a display device. Background technique [0002] Liquid Crystal Display (LCD) has now occupied the dominant position in the field of flat panel display due to its advantages of stable picture, vivid image, radiation elimination, space saving and energy saving. TFT-LCD (Thin Film Transistor-Liquid Crystal Display, thin film transistor liquid crystal display) is the current mainstream liquid crystal display. [0003] A very important specification in a liquid crystal display is the light transmittance, and the most important factor determining the light transmittance is the aperture ratio. The aperture ratio is simply the ratio of the effective area through which light can pass; the liquid crystal panel includes an array substrate and a color filter substrate. The schematic diagram of the array substr...

AI Technical Summary

Problems solved by technology

However, in the prior art, the passivation layer via hole is usually not arranged above the gate line area, and the capacitance C formed between the gate line and the source electrode and the pixel electrode gs The size of 30fF-100fF, so the jump voltage ΔV p between 0.5V-1.0V; if the passivation layer via hole is set above the grid line area, the effective light-transmitting area can be increased to a large extent, thereby increasing the aperture ratio of the pixel; however, if the The passivation layer via hole is set on the gate line, and the capacitance C formed between the gate line and the source electrode and the pixel electrode gs The size of 200fF-500fF, then the jump voltage ΔV p Between 2.5V-7.0V, because the jump voltage is too large, it will cause defective products such as image flicker or afterimage

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