Preparation method of hollow microsphere silicon dioxide (SiO2) antireflection film
An anti-reflection film and hollow microsphere technology, applied in solid-state chemical plating, metal material coating process, coating and other directions, can solve the problems such as the inability to significantly improve the light transmittance of solar cells, the thin film is easy to fall off, and the adsorption is poor. , to achieve the effect of improving photoelectric conversion efficiency, low cost, and enhanced absorption capacity
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[0020] First, dissolve TEOS (tetraethyl tetrasilicate) in ethanol to make 240ml of alcohol solution with a concentration of 0.416mol / L, and add 30mL of it dropwise under stirring at a speed of 300r / min polyacrylic acid, followed by dropwise addition of 25 mL of oxalic acid aqueous solution with a concentration of 3.12 mol / L, TEOS and H 2 Hydrolysis and condensation reaction occurs in O, but the reaction rate is very slow. In this embodiment, oxalic acid is added to increase the rate of hydrolysis reaction. Then the reaction system was stirred and homogenized for 4 hours to form a sol, which was left to age for 8-10 days.
[0021] The glass substrate is washed with water to remove surface stains, then ultrasonically washed with alcohol, then ultrasonically pickled, then soaked in alcohol and dried with alcohol to make the substrate clean. Subsequently, a film was coated on a glass substrate by a spin coating method, and the coated glass substrate was dried at 70°C. Finally, p...
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