Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Colored photosensitive resin composition

A technology of photosensitive resin and composition, applied in optics, filters, optical elements, etc., can solve the problem of foreign matter, and achieve the effect of reducing foreign matter and inhibiting peeling

Inactive Publication Date: 2013-04-10
SUMITOMO CHEM CO LTD
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the currently proposed colored photosensitive resin composition, during development, a part of the unexposed portion of the composition layer formed of the colored photosensitive resin composition is peeled off, and the peeled sheet is sometimes attached to the colored pattern as a foreign substance. Happening

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Colored photosensitive resin composition
  • Colored photosensitive resin composition
  • Colored photosensitive resin composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0376] Next, examples will be given to further specifically describe the present invention. In the examples, % and parts indicating the content or usage amount are based on mass unless otherwise specified.

Synthetic example 1

[0378] In the flask that is equipped with condenser tube and stirring device, drop into the mixture (commercial name Chugai Aminol Fast Pink R of the compound shown in formula (A1-1a) and the compound shown in formula (A1-1b) 15 parts, chloroform 150 parts and 8.9 parts of N,N-dimethylformamide were added dropwise to 10.9 parts of thionyl chloride while maintaining the temperature below 20°C under stirring. After completion of the dropwise addition, the temperature was raised to 50°C, and the reaction was maintained at the same temperature for 5 hours, and then cooled to 20°C. While maintaining the cooled reaction solution at 20° C. or lower with stirring, a mixed solution of 12.5 parts of 2-ethylhexylamine and 22.1 parts of triethylamine was added dropwise. Thereafter, the reaction mixture was stirred at the same temperature for 5 hours. Next, the solvent of the obtained reaction mixture was distilled off with a rotary evaporator, and then a small amount of methanol was adde...

Synthetic example 2

[0382] Into a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, 0.02 L / min of nitrogen was passed through to make a nitrogen atmosphere, 268 parts of ethyl lactate were added, and the mixture was heated to 70° C. while stirring. Next, 55 parts of acrylic acid, 81 parts of N-cyclohexylmaleimide, 3,4-epoxytricyclo[5.2.1.0 2.6 ]decyl ester (the compound shown in the formula (I-1) and the compound shown in the formula (II-1) are mixed at a molar ratio of 50:50) 224 parts, and acrylic tricyclo[5.2.1.0 2. 6 ] Decen-8-yl ester (the compound represented by the formula (c-1) and the compound represented by the formula (c-2) are mixed at a molar ratio of 50:50) and 7 parts are dissolved in 140 parts of ethyl lactate to prepare A solution was formed, and the solution was added dropwise into a flask kept at 70° C. using a dropping funnel over a period of 4 hours.

[0383]

[0384] On the other hand, a solution obtained by dissolving 30 parts of ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
acid valueaaaaaaaaaa
Login to View More

Abstract

The invention provides a colored photosensitive resin composition containing a colorant, resin, polymerized compounds, and a polymerization initiator; the colorant is a colorant containing a dye; the resin is resin containing a copolymer which comprises the following structure units: a structure unit derived from at least one of a group formed by compounds selected from unsaturated carboxylic acid and unsaturated carboxylic acid anhydride, a structure unit derived from monomers with cyclic ether structures with a carbon atom number of 2-4 and ethylene unsaturated bonds, and a structure unit derived from a monomer shown in formula (x); with respect to the total amount of structure units forming the copolymer, the content of the structure unit derived from the monomer shown in formula (x) is more than 0.1 mol% and less than 20 mol%. [In formula (x), Ra1 represents an alkyl with a hydrogen atom number or a carbon atom number of 1-4; Xa1 represents a single bond, -Xa2-, *-Xa2-O-, *-Xa2-S- or *-Xa2-NH-; Xa2 represents an alkylene with a carbon atom number of 1-6; * represents a bonding position with O].

Description

technical field [0001] The present invention relates to a colored photosensitive resin composition. Background technique [0002] The colored photosensitive resin composition is used for the manufacture of color filters used in display devices such as liquid crystal display panels, electroluminescence panels, and plasma display panels. As such a colored photosensitive resin composition, there is known a colored photosensitive resin composition (JP2010-211198-A), which contains methacrylic acid and acrylic acid 3,4-epoxytricyclo[5.2.1.0 2.6 ] Copolymers of decyl esters. [0003] When using a colored photosensitive resin composition to form a colored pattern, photolithography can be used, that is, the colored photosensitive resin composition is applied to a substrate to form a composition layer, and the composition layer is exposed through a photomask, Development, in order to obtain a pattern method. However, in the currently proposed colored photosensitive resin compositi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G02B5/20G02F1/1335
CPCC08F2/50C09B11/24C09B67/0033G02B1/04G02B5/223G03F7/0233G03F7/027G03F7/033
Inventor 桐生泰行
Owner SUMITOMO CHEM CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com