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Plasma generation device and method based on back corona creeping-surface breakdown of catalyst as well as application thereof

A plasma and generating device technology, applied in the field of plasma generation, can solve the problems of energy consumption, reduce the energy efficiency of the reactor, etc., and achieve the effect of improving the effect of purification treatment

Inactive Publication Date: 2013-03-06
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At the same time, the generation and demise of active particles in the plasma region consumes energy, which also reduces the energy efficiency of the reactor.

Method used

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  • Plasma generation device and method based on back corona creeping-surface breakdown of catalyst as well as application thereof
  • Plasma generation device and method based on back corona creeping-surface breakdown of catalyst as well as application thereof
  • Plasma generation device and method based on back corona creeping-surface breakdown of catalyst as well as application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Such as figure 1 As shown, a plasma generation device based on the surface breakdown of catalyst back corona, including a plasma generator 7, a high voltage power supply 5, a pair of high and low voltage electrodes composed of a corona electrode 1 and a porous electrode 4, an auxiliary electrode 2, Auxiliary power supply 6 and high specific resistance catalyst layer 3; wherein:

[0029] The high and low voltage electrode pairs are set in the plasma generator 7, and the distance between the two electrodes is 3cm; the high specific resistance catalyst layer 3 is set between the high and low voltage electrode pairs; the auxiliary electrode 2 is set between the corona electrode 1 and the high specific resistance catalyst layer 3 The distance between the corona electrode 1 and the corona electrode 1 is 2 cm; one end of the auxiliary power supply 6 is connected to the auxiliary electrode 2, and the other end is grounded; one end of the high-voltage power supply 5 is connected...

Embodiment 2

[0042] Such as figure 2 As shown, a plasma generation device based on the surface breakdown of catalyst back corona, including a plasma generator 8, a high voltage power supply, a high and low voltage electrode pair composed of a corona electrode 1 and a porous electrode 4, an auxiliary electrode 2 and a high Specific resistance catalyst layer 3; wherein:

[0043] The high and low voltage electrode pairs are set in the plasma generator 8, and the distance between the two electrodes is 3cm; the high specific resistance catalyst layer 3 is set between the high and low voltage electrode pairs; the auxiliary electrode 2 is set between the corona electrode 1 and the high specific resistance catalyst layer 3 The distance between the corona electrode 1 and the corona electrode 1 is 16 mm; the high-voltage power supply is connected to the corona electrode 1, and the porous electrode 4 is grounded.

[0044] The high-voltage power supply adopts a DC power supply 5 and is composed of a...

Embodiment 3

[0054] Such as image 3 As shown, a plasma generation device based on the surface breakdown of catalyst back corona, including a plasma generator 7, a high voltage power supply 5, a pair of high and low voltage electrodes composed of a corona electrode 1 and a porous electrode 4, an auxiliary electrode 2, Auxiliary power supply 6 and high specific resistance catalyst layer 3; wherein:

[0055] The high and low voltage electrode pairs are set in the plasma generator 7, and the distance between the two electrodes is 3cm; the high specific resistance catalyst layer 3 is set between the high and low voltage electrode pairs; the auxiliary electrode 2 is set between the corona electrode 1 and the high specific resistance catalyst layer 3 The distance between the corona electrode 1 and the corona electrode 1 is 15mm; one end of the high-voltage power supply 5 is connected to the corona electrode 1, and the other end is connected to the porous electrode 4; one end of the auxiliary pow...

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Abstract

The invention discloses a plasma generation device based on back corona creeping-surface breakdown of a catalyst. The plasma generation device comprises a plasma generator and a high-voltage power supply, wherein high-low-voltage electrode pairs consisting of corona electrodes and porous electrodes are arranged in the plasma generator; a high specific resistance catalyst layer is arranged between the high-low-voltage electrode pairs; and a high-voltage power supply is connected with the high-low-voltage electrode pairs. The invention further discloses a plasma generation method. According to the plasma generation method, basic conditions of a charge accumulated on the catalyst are provided by adopting a high specific resistance catalyst which has low possibility of releasing the charge; the charge generated by corona discharge forms back corona creeping-surface breakdown on the high specific resistance catalyst layer and generates a plasma on the creeping surface of the catalyst, so that the plasma is tightly combined with the catalyst.

Description

technical field [0001] The invention belongs to the technical field of plasma generation, and in particular relates to a plasma generation device and method based on surface breakdown of catalyst back corona. Background technique [0002] Plasma is a material aggregation state of positively and negatively charged particles and neutral particles that are fully ionized or partially ionized and have approximately equal charges. Plasma can generate active components, causing physical changes and chemical reactions that are difficult to achieve in conventional chemical reactions. The combination of plasma and catalyst can produce synergistic effect and promote the progress of catalytic reaction. [0003] There are many ways to generate low-temperature plasma, such as strong electric field, laser, microwave, high-energy particle bombardment, heating, etc. Corona discharge and dielectric barrier discharge are the most commonly used methods of low temperature plasma generation. T...

Claims

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Application Information

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IPC IPC(8): H05H1/24B01D53/76B01D53/86B01D53/44
Inventor 闫克平冯发达叶菱玲刘冀刘振
Owner ZHEJIANG UNIV
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