Crystalline silicon containing up-conversion luminance quantum dot and preparation method of crystalline silicon
A technology of luminescent quantum and crystalline silicon, which is applied in the direction of semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of low conversion efficiency and low light absorption utilization rate of crystalline silicon solar cells, and achieve improved conversion efficiency, Improve the utilization rate of absorption and increase the effect of absorption
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[0018] The preparation method of crystalline silicon containing up-conversion luminescent quantum dots of the present invention comprises the following steps:
[0019] Step 1. Doping 8ppbw~120ppmw of rare earth elements into the solar-grade polysilicon raw material, using the conventional CZ method to produce monocrystalline silicon, or utilizing the conventional ingot casting method to produce polycrystalline silicon, the atomic number concentration of the rare earth elements in the single crystal silicon or polycrystalline silicon for 10 10 ~10 16 atoms / cm 3 ;
[0020] Step 2. Annealing the single crystal silicon or polycrystalline silicon obtained in step 1 at 700°C to 1000°C to obtain single crystal silicon or polycrystalline silicon containing up-conversion luminescent quantum dots.
[0021] The rare earth element is preferably erbium (Er), promethium (Pm), gadolinium (Gd), holmium (Ho), thulium (Tm) or samarium (Sm). Or an oxide of one of the rare earth elements erbi...
Embodiment 1
[0023] Select monocrystalline silicon A and monocrystalline silicon B, monocrystalline silicon A is P-type monocrystalline silicon obtained by the conventional CZ method, and monocrystalline silicon B is obtained by doping 50ppbw erbium (Er) into solar-grade polycrystalline silicon raw materials and utilizing CZ method. , respectively select a section on single crystal silicon A and single crystal silicon B to obtain single crystal silicon A' section and single crystal silicon B' section, wherein the single crystal silicon section A and single crystal silicon B section do not undergo annealing treatment, and the single crystal silicon section The silicon A' section and the monocrystalline silicon B' section were annealed at 800°C for 2 hours; the above four sections of crystal were sliced to make a solar cell, and the conversion efficiency was tested with a solar cell characteristic tester to obtain the following data, see Table 1:
[0024] Table 1, Example 1 four-section cr...
Embodiment 2
[0027] Select monocrystalline silicon C and monocrystalline silicon D. Monocrystalline silicon C is P-type monocrystalline silicon obtained by the conventional CZ method. Monocrystalline silicon D is obtained by doping 100ppbw promethium (Pm) into solar-grade polycrystalline silicon raw materials and using CZ method. Single crystal silicon, select a section on single crystal silicon C and single crystal silicon D respectively, to obtain single crystal silicon C' section and single crystal silicon D' section, wherein single crystal silicon C section and single crystal silicon D section do not undergo annealing treatment , monocrystalline silicon C′ and monocrystalline silicon D′ sections were annealed at 800°C for 2 hours; the four sections of crystals were sliced to produce solar cells, and the conversion efficiency was tested with a solar cell characteristic tester to obtain the following data, see Table 2:
[0028] Table 2, Example 2 Four sections of crystals are sliced ...
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