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Urethane polymeric monomer with end groups including vinyl ether and allyl ether and synthetic method thereof

A technology of vinyl ether and allyl ether, which is applied in the field of synthesis of urethane polymer monomers, can solve the problems of impact and moisture impact, and achieve the effects of accelerated polymerization rate, low cost, and convenient storage and transportation

Active Publication Date: 2012-07-18
HUBEI GURUN TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the cationic polymerization system also has its own shortcomings, which are greatly affected by moisture and the surrounding environment.

Method used

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  • Urethane polymeric monomer with end groups including vinyl ether and allyl ether and synthetic method thereof
  • Urethane polymeric monomer with end groups including vinyl ether and allyl ether and synthetic method thereof
  • Urethane polymeric monomer with end groups including vinyl ether and allyl ether and synthetic method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] The synthetic method of monomer A-2:

[0038] Add 16.820g (0.10mol) of HDI (hexamethylene diisocyanate) and 0.2ml of dibutyltin dilaurate into a 500mL four-necked flask, then add 100ml of acetone solvent to dilute, and stir in an ice-water bath to cool it below 10°C . Dissolve 11.616g (0.10mol) of 4-hydroxybutyl vinyl ether in 50mL of acetone, and slowly add it dropwise into the four-necked flask, keeping the temperature of the solution in the four-necked flask below 10°C for about two hours Drip finished. After dropping, remove the ice-water bath, raise the temperature to 30°C and continue stirring for 1.5h, then add dropwise 50ml of acetone solution dissolved with 5.808g of allyl alcohol (0.10mol), and use the heat of reaction to maintain the temperature at about 20-40°C. After the dropwise addition was completed, the temperature was raised to 50-55° C. and the stirring reaction was continued for 2 h. After the reaction was completed, the acetone was removed by rot...

Embodiment 2

[0040] The synthetic method of monomer A-7:

[0041] Use 3-hydroxypropyl vinyl ether to replace 4-hydroxybutyl vinyl ether in [Example 1], and the remaining reagents and dosages are the same as [Example 1].

Embodiment 3

[0043] The synthetic method of monomer A-17:

[0044] Replace allyl alcohol in [Example 1] with 3-(allyloxy) propan-1-alcohol, and replace 4-hydroxybutyl vinyl ether in [Example 1] with diethylene glycol monovinyl ether , all the other reagents and consumption are identical with [Example 1].

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Abstract

A urethane photosensitive monomer with end groups including vinyl ether and allyl ether is characterized in that the general formula of the photosensitive monomer is R1OCONH-X-NHCOOR2, wherein R1 refers to a vinyl ether alkyl group, R2 refers to an allyl ether alkyl group, and X shows that the number of carbon atoms in divalent cyclohexyl or a divalent cyclohexyl group with a substitutional group, a divalent aryl group or a divalent aryl group with a substitutional group, divalent diphenylmethane or diphenylmethane with a substitutional group, and a divalent methylene group. The urethane photosensitive monomer has the advantages that the urethane monomer is taken as a polymeric monomer with a photosensitive layer formed through directly platemaking violet laser and a free radical-cation mixed photo-curing coating can improve the adhesive property of the photosensitive layer. The invention further provides a synthetic method which has a simple process, is high in productivity and lower in cost and reduces the environmental pollution.

Description

technical field [0001] The technical field of the present invention is the field of new photofunctional materials for imaging information recording materials, that is, a method for synthesizing urethane polymer monomers whose end groups are vinyl ether and allyl ether. Specifically, under the condition of adding a photoinitiator, the material is irradiated with ultraviolet light, and the two double bonds are rapidly polymerized and solidified. It can be used for the photosensitive layer of the direct plate making of the ultraviolet laser and the free radical-cation mixed photocurable coating. Background technique [0002] The so-called photoradical-cation mixed curing system refers to a system that simultaneously generates free radicals and cationic active particles in the same system, thereby simultaneously triggering free radical photopolymerization and cationic photopolymerization. Free radical photopolymerization has some serious disadvantages: firstly, free radical phot...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C271/20C07C271/24C07C271/28C07C269/02
Inventor 邹应全刁翠梅何长华
Owner HUBEI GURUN TECH CO LTD
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