ZnO substrate epitaxy structure, manufacture method thereof and ZnO substrate chip structure
A technology of epitaxial structure and manufacturing method, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., and can solve problems such as blue light spot, low light extraction efficiency, yellow phosphor coating thickness, yellow aperture, etc.
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[0028] Such as figure 1 As shown, a ZnO substrate epitaxial structure includes an epitaxial wafer, and the epitaxial wafer includes a ZnO substrate 1, a GaN transition layer 2, a first N-GaN contact layer 3, doped Si and Zn In 0.2 Ga 0.8 N / GaN multi-quantum well light-emitting layer 4, first P-GaN contact layer 5, N-GaN cascade layer 6, second N-GaN contact layer 7, In doped with Si and Zn 0.49 Ga 0.51 N / GaN multi-quantum well light-emitting layer 8 and the second P-GaN contact layer 9 . ZnO substrate is a nanoscale material with wide energy band gap, high refractive index, high light transmittance, and has excellent fluorescence effect and electroluminescent function.
[0029] Wherein, the thickness of the ZnO substrate 1 is 50-200um, preferably 100um.
[0030] Wherein, the thickness of the GaN transition layer 2 is 10-100 nm, preferably 50 nm.
[0031] Wherein, the thicknesses of the first N-GaN contact layer 3 and the second N-GaN contact layer 7 are both 200-1000 nm,...
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