Manufacturing method for indium tin oxide (ITO)/zinc sulfide (ZnS)/cadmium selenide (CdSe)/ZnS/aluminum (Al) structure with visible light and near-infrared luminescence emission characteristics
A technology of emission characteristics and manufacturing methods, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of device stability and life, and achieve the effects of wide emission wavelength range, low turn-on voltage, and simple manufacturing methods
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[0024] The technical scheme of the present invention is described in further detail below by specific embodiments:
[0025] (1) Preparation of ITO substrate.
[0026] The ITO substrate is purchased from the market, the thickness of ITO is 60nm, and it needs to be cleaned and degassed before growth.
[0027] (2) The first layer of ZnS film is grown by thermal evaporation.
[0028] The ZnS film was grown at room temperature with a thickness of 150nm and a growth pressure of 4×10 -3 Pa.
[0029] (3) Spin-coat CdSe quantum dots with a thickness of 500nm and allow them to air-dry naturally.
[0030] (4) The second layer of ZnS film is grown by thermal evaporation.
[0031] The ZnS film was grown at room temperature with a thickness of 150nm and a growth pressure of 4×10 -3 Pa.
[0032] (5) Thermal evaporation Al electrode.
[0033] A 200nm Al thin film was grown at room temperature as an electrode layer.
[0034] (6) Photolithography to form electroluminescent device patter...
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